Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406843 | Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium | Kazuhiro Harada, Masayoshi Minami, Shogo Otani, Yoshitomo HASHIMOTO | 2025-09-02 |
| 11885016 | Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus and recording medium | Kazuhiro Harada, Masayoshi Minami | 2024-01-30 |
| 11823886 | Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium | Kazuhiro Harada, Masayoshi Minami, Shogo Otani, Yoshitomo HASHIMOTO | 2023-11-21 |
| 11728159 | Method of manufacturing semiconductor device, surface treatment method, substrate processing apparatus, and recording medium | Kazuhiro Harada, Masayoshi Minami, Akihito Yoshino, Masaya NISHIDA, Naoko Kitagawa +1 more | 2023-08-15 |
| 11515152 | Method of manufacturing semiconductor device, substrate processing apparatus, and method of processing substrate | Kazuhiro Harada, Shogo Otani, Koichi Honda, Mamoru Umemoto, Kazuhiro Shimoda +3 more | 2022-11-29 |
| 11434564 | Method of manufacturing semiconductor device, substrate processing apparatus, recording medium and method of processing substrate | Kazuhiro Harada, Masayoshi Minami | 2022-09-06 |
| 11257669 | Method of manufacturing semiconductor device, surface treatment method, substrate processing apparatus, and recording medium | Kazuhiro Harada, Masayoshi Minami, Akihito Yoshino, Masaya NISHIDA, Naoko Kitagawa +1 more | 2022-02-22 |
| 10287680 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Ryota Sasajima, Kosuke Takagi | 2019-05-14 |
| 10096463 | Method of manufacturing semiconductor device, substrate processing apparatus comprising exhaust port and multiple nozzles, and recording medium | Yoshitomo HASHIMOTO, Tatsuru Matsuoka, Masaya NAGATO, Ryota Horiike | 2018-10-09 |
| 10081868 | Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium | Kosuke Takagi, Ryota Sasajima, Naonori Akae, Risa YAMAKOSHI, Toshiki Fujino +2 more | 2018-09-25 |
| 10066294 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Ryota Sasajima, Masayoshi Minami | 2018-09-04 |
| 10036092 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Ryota Sasajima | 2018-07-31 |
| 9496134 | Substrate processing apparatus, method of manufacturing semiconductor device and semiconductor device | Shinya Sasaki, Yuji Takebayashi | 2016-11-15 |
| 9340872 | Cleaning method, manufacturing method of semiconductor device, substrate processing apparatus, and recording medium | Ryota Sasajima | 2016-05-17 |
| D610559 | Reaction tube | Satoshi Okada, Yuji Takebayashi, Tsutomu Kato, Atsuhiko Ashitani | 2010-02-23 |