MN

Masaya NAGATO

KE Kokusai Electric: 10 patents #52 of 583Top 9%
HE Hitachi Kokusai Electric: 2 patents #354 of 843Top 45%
CL Central Glass Company, Limited: 1 patents #505 of 968Top 55%
📍 Toyama, JP: #235 of 1,699 inventorsTop 15%
Overall (All Time): #399,118 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12424437 Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium Tomiyuki SHIMIZU, Takashi Ozaki, Yoshitomo HASHIMOTO, Katsuyoshi Harada 2025-09-23
12371782 Method of manufacturing semiconductor device and non-transitory computer-readable recording medium Masanori OKUNO, Tatsuya Yotsutani, Toshihiko Yonejima 2025-07-29
12094708 Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device Yoshitomo HASHIMOTO 2024-09-17
11978623 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Yoshitomo HASHIMOTO, Katsuyoshi Harada, Kimihiko NAKATANI, Yoshiro Hirose, Takashi Ozaki +1 more 2024-05-07
11961733 Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium Tomiyuki SHIMIZU, Takashi Ozaki, Yoshitomo HASHIMOTO, Katsuyoshi Harada 2024-04-16
11527402 Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device Yoshitomo HASHIMOTO, Katsuyoshi Harada, Kimihiko NAKATANI, Yoshiro Hirose, Takashi Ozaki +1 more 2022-12-13
10968517 Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Shin SONE, Kenji Kameda, Kotaro Konno 2021-04-06
10910214 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Yoshitomo HASHIMOTO, Masanori NAKAYAMA, Tatsuru Matsuoka, Hiroki Tamashita, Takafumi Nitta +1 more 2021-02-02
10586698 Method of manufacturing semiconductor device, substrate processing apparatus and recording medium Yoshitomo HASHIMOTO, Yushin Takasawa 2020-03-10
10156012 Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording medium Kenji Kameda, Akiou Kikuchi, Yuta Takeda, Kunihiro Yamauchi 2018-12-18
10096463 Method of manufacturing semiconductor device, substrate processing apparatus comprising exhaust port and multiple nozzles, and recording medium Yoshitomo HASHIMOTO, Tatsuru Matsuoka, Ryota Horiike, Shintaro Kogura 2018-10-09
9976214 Cleaning method and method of manufacturing semiconductor device Koei KURIBAYASHI, Kenji Kameda 2018-05-22