Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10287680 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Shintaro Kogura, Kosuke Takagi | 2019-05-14 |
| 10081868 | Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium | Kosuke Takagi, Shintaro Kogura, Naonori Akae, Risa YAMAKOSHI, Toshiki Fujino +2 more | 2018-09-25 |
| 10066294 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Shintaro Kogura, Masayoshi Minami | 2018-09-04 |
| 10036092 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Shintaro Kogura | 2018-07-31 |
| 9966252 | Method of manufacturing semiconductor device and substrate processing apparatus | Yoshiro Hirose, Yosuke Ota, Naonori Akae, Kojiro Yokozawa | 2018-05-08 |
| 9966251 | Method of manufacturing semiconductor device and substrate processing apparatus | Yoshiro Hirose, Yosuke Ota, Naonori Akae, Kojiro Yokozawa | 2018-05-08 |
| 9881789 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshitomo HASHIMOTO, Yoshiro Hirose, Shingo NOHARA, Katsuyoshi Harada, Yuji Urano | 2018-01-30 |
| 9837262 | Method of manufacturing a SiOCN film, substrate processing apparatus and recording medium | Yoshinobu Nakamura | 2017-12-05 |
| 9691606 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshitomo HASHIMOTO, Yoshiro Hirose, Katsuyoshi Harada, Yoshinobu Nakamura | 2017-06-27 |
| D783351 | Gas nozzle substrate processing apparatus | Toshiki Fujino, Kosuke Takagi | 2017-04-11 |
| 9620357 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshitomo HASHIMOTO, Yoshiro Hirose, Shingo NOHARA, Katsuyoshi Harada, Yuji Urano | 2017-04-11 |
| 9455137 | Method of manufacturing semiconductor device | Yoshiro Hirose, Yushin Takasawa, Tsukasa Kamakura, Yoshinobu Nakamura | 2016-09-27 |
| 9431236 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshinobu Nakamura | 2016-08-30 |
| 9412585 | Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium | Yoshinobu Nakamura | 2016-08-09 |
| 9394607 | Substrate processing apparatus | Masaya NISHIDA, Seiyo Nakashima, Tomoyasu Miyashita | 2016-07-19 |
| 9390911 | Method of manufacturing semiconductor device | Yoshiro Hirose, Yoshinobu Nakamura, Ryuji Yamamoto | 2016-07-12 |
| 9378943 | Method of manufacturing semiconductor device, method of processing substrate substrate processing apparatus and non-transitory computer-readable recording medium | Yoshiro Hirose, Yushin Takasawa, Tsukasa Kamakura, Yoshinobu Nakamura | 2016-06-28 |
| 9340872 | Cleaning method, manufacturing method of semiconductor device, substrate processing apparatus, and recording medium | Shintaro Kogura | 2016-05-17 |
| 9263253 | Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium | Yoshinobu Nakamura | 2016-02-16 |
| 9218955 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshinobu Nakamura, Kazuyuki Okuda | 2015-12-22 |
| 9136114 | Method of manufacturing semiconductor device, substrate processing method, computer-readable medium with program for executing a substrate processing method, and substrate processing apparatus | Yoshinobu Nakamura, Yushin Takasawa, Yoshiro Hirose | 2015-09-15 |
| 9096928 | Method of manufacturing semiconductor device and substrate processing apparatus | Yoshiro Hirose, Naonori Akae, Osamu Kasahara | 2015-08-04 |
| 9039838 | Method of manufacturing semiconductor device and substrate processing apparatus | Yoshiro Hirose, Yosuke Ota, Naonori Akae, Kojiro Yokozawa | 2015-05-26 |
| 8951919 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Yoshinobu Nakamura | 2015-02-10 |
| 8946092 | Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus | Yoshiro Hirose, Yushin Takasawa, Tsukasa Kamakura, Yoshinobu Nakamura | 2015-02-03 |