SN

Sadao Nakashima

HE Hitachi Kokusai Electric: 9 patents #97 of 843Top 15%
NT NTT: 4 patents #1,310 of 4,871Top 30%
KC Komatsu Electronic Metals Co.: 3 patents #33 of 160Top 25%
Overall (All Time): #383,684 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
9074284 Heat treatment apparatus Masanao Fukuda, Kenji Shirako, Akihiro Sato, Kazuhiro Morimitsu 2015-07-07
8889533 Method of manufacturing semiconductor device, method of manufacturing substrate and substrate processing apparatus Takafumi Sasaki, Yoshinori Imai, Koei KURIBAYASHI 2014-11-18
8679989 Method of manufacturing semiconductor device including removal of deposits from process chamber and supply portion Takahiro Maeda, Kiyohiko Maeda, Kenji Kameda, Yushin Takasawa 2014-03-25
8450220 Substrate processing apparatus , method of manufacturing semiconductor device, and method of manufacturing substrate Takafumi Sasaki, Yoshinori Imai, Koei KURIBAYASHI 2013-05-28
8409352 Method of manufacturing semiconductor device, method of manufacturing substrate and substrate processing apparatus Koei KURIBAYASHI, Yoshinori Imai, Takafumi Sasaki 2013-04-02
8246749 Substrate processing apparatus and semiconductor device producing method Jie Wang, Ryuji Yamamoto 2012-08-21
7901206 Heat-treating apparatus and method of producing substrates Akira Morohashi, Iwao Nakamura, Ryota Sasajima, Keishin Yamazaki 2011-03-08
7865070 Heat treating apparatus Iwao Nakamura, Naoto Nakamura 2011-01-04
7667301 Thermal treatment apparatus, method for manufacturing semiconductor device, and method for manufacturing substrate Naoto Nakamura, Iwao Nakamura, Tomoharu SHIMADA, Kenichi Ishiguro 2010-02-23
5989981 Method of manufacturing SOI substrate Terukazu Ohno, Toshiaki Tsuchiya, Tetsushi Sakai, Shinji Nakamura, Takemi Ueki +2 more 1999-11-23
5918136 SOI substrate and method of producing the same Katsutoshi Izumi, Norihiko Ohwada, Tatsuhiko Katayama 1999-06-29
5665613 Method of making semiconductor device having SIMOX structure Katsutoshi Izumi, Norihiko Ohwada, Tatsuhiko Katayama 1997-09-09
5658809 SOI substrate and method of producing the same Katsutoshi Izumi, Norihiko Ohwada, Tatsuhiko Katayama 1997-08-19