Issued Patents All Time
Showing 26–50 of 98 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10047430 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2018-08-14 |
| 9984911 | Electrostatic chuck design for high temperature RF applications | Ryan Edwin Hanson, Manjunatha Koppa, Vijay D. Parkhe, Keith A. Miller | 2018-05-29 |
| 9844172 | Attachment for engineering vehicle | — | 2017-12-19 |
| 9721757 | Elongated capacitively coupled plasma source for high temperature low pressure environments | Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins +1 more | 2017-08-01 |
| 9666416 | Apparatus and method for depositing electronically conductive pasting material | Anantha K. Subramani, Wei Wang | 2017-05-30 |
| 9585296 | Rock rake attachment for engineering vehicle | — | 2017-03-07 |
| 9373485 | Apparatus and method for improved darkspace gap design in RF sputtering chamber | Xianmin Tang | 2016-06-21 |
| 9355819 | Elongated capacitively coupled plasma source for high temperature low pressure environments | Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins +1 more | 2016-05-31 |
| 9269562 | In situ chamber clean with inert hydrogen helium mixture during wafer process | Robert Dinsmore, Song-Moon Suh, Cheng-Hsiung Tsai, Glen T. Mori | 2016-02-23 |
| 9224582 | Apparatus and method for depositing electrically conductive pasting material | Anantha K. Subramani, Wei Wang | 2015-12-29 |
| 9062372 | Self-ionized and capacitively-coupled plasma for sputtering and resputtering | Praburam Gopalraja, Jianming Fu, Xianmin Tang, Umesh M. Kelkar | 2015-06-23 |
| 9017533 | Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning | Daniel J. Hoffman, John Pipitone, Xianmin Tang, Rongjun Wang | 2015-04-28 |
| 8992747 | Apparatus and method for improved darkspace gap design in RF sputtering chamber | Xianmin Tang | 2015-03-31 |
| 8920611 | Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning | Daniel J. Hoffman, John Pipitone, Xianming Tang, Rongjun Wang | 2014-12-30 |
| 8871064 | Electromagnet array in a sputter reactor | Tza-Jing Gung, Xinyu Fu, Arvind Sundarrajan, Edward P. Hammond, IV, Praburam Gopalraja +2 more | 2014-10-28 |
| 8696875 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2014-04-15 |
| 8668816 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2014-03-11 |
| 8642473 | Methods for contact clean | Mei Chang, Linh Thanh, Bo Zheng, Arvind Sundarrajan, Umesh M. Kellkar +1 more | 2014-02-04 |
| 8637410 | Method for metal deposition using hydrogen plasma | Anantha K. Subramani, Seshadri Ganguli, Michael S. Jackson, Xinliang Lu, Wei Wang +2 more | 2014-01-28 |
| 8398832 | Coils for generating a plasma and for sputtering | Jaim Nulman, Sergio Edelstein, Mani Subramani, Zheng Xu, Howard Grunes +2 more | 2013-03-19 |
| 7733095 | Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode | John Pipitone | 2010-06-08 |
| 7704887 | Remote plasma pre-clean with low hydrogen pressure | Xinyu Fu, Jick Yu, Ajay Bhatnagar, Praburam Gopalraja | 2010-04-27 |
| 7687909 | Metal / metal nitride barrier layer for semiconductor device applications | Peijun Ding, Zheng Xu, Hong Mei Zhang, Xianmin Tang, Praburam Gopalraja +7 more | 2010-03-30 |
| 7686926 | Multi-step process for forming a metal barrier in a sputter reactor | Tza-Jing Gung, Xinyu Fu, Arvind Sundarrajan, Edward P. Hammond, IV, Praburam Gopalraja +2 more | 2010-03-30 |
| 7658802 | Apparatus and a method for cleaning a dielectric film | Xinyu Fu, Wei Wang | 2010-02-09 |