Issued Patents All Time
Showing 76–98 of 98 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D450070 | Sputtering chamber coil | Praburam Gopalraja, Zheng Xu, Michael Rosenstein | 2001-11-06 |
| 6313027 | Method for low thermal budget metal filling and planarization of contacts vias and trenches | Zheng Xu, Tse-Yong Yao | 2001-11-06 |
| 6306265 | High-density plasma for ionized metal deposition capable of exciting a plasma wave | Jianming Fu, Praburam Gopalraja, Fusen Chen | 2001-10-23 |
| 6297595 | Method and apparatus for generating a plasma | Bradley O. Stimson | 2001-10-02 |
| 6264812 | Method and apparatus for generating a plasma | Ivo Raaijmakers, Bradley O. Stimson | 2001-07-24 |
| 6254746 | Recessed coil for generating a plasma | Anantha K. Subramani, Bradley O. Stimson, Sergio Edelstein, Howard Grunes, Avi Tepman +1 more | 2001-07-03 |
| D442853 | Rounded overlap coil | Praburam Gopalraja, Michael Rosenstein | 2001-05-29 |
| D442852 | Squared overlap coil | Praburam Gopalraja, Michael Rosenstein | 2001-05-29 |
| 6235169 | Modulated power for ionized metal plasma deposition | Praburam Gopalraja, Zheng Xu, Bradley O. Stimson | 2001-05-22 |
| 6228229 | Method and apparatus for generating a plasma | Ivo Raaijmakers, Bradley O. Stimson | 2001-05-08 |
| 6217721 | Filling narrow apertures and forming interconnects with a metal utilizing a crystallographically oriented liner layer | Zheng Xu, Tse-Yong Yao, Jaim Nulman, Fusen Chen | 2001-04-17 |
| D440582 | Sputtering chamber coil | Praburam Gopalraja, Zheng Xu, Michael Rosenstein, Peijun Ding | 2001-04-17 |
| 6193855 | Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage | Praburam Gopalraja | 2001-02-27 |
| 6190513 | Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition | Bradley O. Stimson, Zheng Xu | 2001-02-20 |
| 6176981 | Wafer bias ring controlling the plasma potential in a sustained self-sputtering reactor | Liubo Hong, Jianming Fu | 2001-01-23 |
| 6149784 | Sputtering chamber shield promoting reliable plasma ignition | Jingang Su, Nelson Yee, Kenny King-Tai Ngan, Lisa Yang | 2000-11-21 |
| 6136095 | Apparatus for filling apertures in a film layer on a semiconductor substrate | Zheng Xu, Tse-Yong Yao | 2000-10-24 |
| 6132566 | Apparatus and method for sputtering ionized material in a plasma | Ralf Hofmann | 2000-10-17 |
| 5962923 | Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches | Zheng Xu, Tse-Yong Yao | 1999-10-05 |
| 5897752 | Wafer bias ring in a sustained self-sputtering reactor | Liubo Hong, Jianming Fu | 1999-04-27 |
| 5763851 | Slotted RF coil shield for plasma deposition system | Aihua Chen, Howard Grunes, Robert B. Lowrance, Ralf Hofmann, Zheng Xu +1 more | 1998-06-09 |
| 5685941 | Inductively coupled plasma reactor with top electrode for enhancing plasma ignition | Barney M. Cohen, Bradley O. Stimson, George Arthur Proulx | 1997-11-11 |
| 5516403 | Reversing orientation of sputtering screen to avoid contamination | James Van Gogh, Avi Tepman | 1996-05-14 |