Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12397330 | Condition selectable backside gas | Stephen Prouty, Martin Perez-Guzman, Sumanth Banda, Rajinder Dhindsa | 2025-08-26 |
| 12334315 | Cooled substrate support assembly for radio frequency environments | Vijay D. Parkhe, Andreas Schmid, Andrew Antoine NOUJAIM, Stephen Prouty, Martin Perez-Guzman | 2025-06-17 |
| 11996294 | Cryogenic atomic layer etch with noble gases | Zhonghua Yao, Sunil Srinivasan, Sang Wook Park | 2024-05-28 |
| 11764041 | Adjustable thermal break in a substrate support | Daniel Sang Byun, Andreas Schmid, Stephen Prouty, Andrew Antoine NOUJAIM | 2023-09-19 |
| 11666952 | Condition selectable backside gas | Stephen Prouty, Martin Perez-Guzman, Sumanth Banda, Rajinder Dhindsa | 2023-06-06 |
| 11646183 | Substrate support assembly with arc resistant coolant conduit | Stephen Prouty, Andreas Schmid, Andrew Antoine NOUJAIM | 2023-05-09 |
| 11515166 | Cryogenic atomic layer etch with noble gases | Zhonghua Yao, Sunil Srinivasan, Sang Wook Park | 2022-11-29 |
| 11437261 | Cryogenic electrostatic chuck | Yogananda Sarode Vishwanath, Steven E. Babayan, Stephen Prouty, Andreas Schmid, Andrew Antoine NOUJAIM | 2022-09-06 |
| 11087989 | Cryogenic atomic layer etch with noble gases | Zhonghua Yao, Sunil Srinivasan, Sang Wook Park | 2021-08-10 |
| 10656029 | Processing system having optical temperature measurement subsystem | — | 2020-05-19 |
| 9257265 | Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactor | Waheb Bishara, Samer Banna | 2016-02-09 |