Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5716484 | Contaminant reduction improvements for plasma etch chambers | Greg Blackburn, Richard McGovern, Yan Rozenzon | 1998-02-10 |
| 5693179 | Contaminant reduction improvements for plasma etch chambers | Greg Blackburn, Richard McGovern, Yan Rozenzon | 1997-12-02 |
| 5480052 | Domed extension for process chamber electrode | Michael G. Furr, Greg Blackburn, Richard McGovern | 1996-01-02 |
| 5474649 | Plasma processing apparatus employing a textured focus ring | Richard McGovern, Greg Blackburn | 1995-12-12 |