Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Contaminant reduction improvements for plasma etch chambers

Contaminant reduction improvements for plasma etch chambers

US Patent 5716484 · Granted Feb 10, 1998

Estimated economic value: $89,643,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gas hub for plasma reactor2023
Ground bar and method of grounding2022
Pedestal lift for semiconductor processing chambers2022
Plasma reactor with highly symmetrical four-fold gas injection2022
Nozzle for multi-zone gas injection assembly2021
Apparatus for exhaust cooling2021
Apparatus for collection and subsequent reaction of liquid and solid effluent in2020
Ground bar2020
Process kit erosion and service life prediction2020
Side gas injection kit for multi-zone gas injection assembly2019
Process kit erosion and service life prediction2019
Plasma reactor with highly symmetrical four-fold gas injection2018