| 9449278 |
Cloud-based diagnostics and remediation |
Efstratios Davlos, Edmund R. Brown, Gavin Anthony Condon |
2016-09-20 |
| 9157151 |
Elimination of first wafer effect for PECVD films |
Annamalai Lakshmanan, Ganesh Balasubramanian, Bok Hoen Kim |
2015-10-13 |
| 8569166 |
Methods of modifying interlayer adhesion |
Li-Qun Xia, Son V. Nguyen, Shankar Venkataraman |
2013-10-29 |
| 7960294 |
Method of modifying interlayer adhesion |
Li-Qun Xia, Son V. Nguyen, Shankar Venkataraman |
2011-06-14 |
| 7910897 |
Process and apparatus for post deposition treatment of low dielectric materials |
— |
2011-03-22 |
| 7611996 |
Multi-stage curing of low K nano-porous films |
Yi Zheng, Kang Sub Yim, Sang-Hoon Ahn, Lester D'Cruz, Dustin W. Ho +4 more |
2009-11-03 |
| 7563728 |
Methods of modifying interlayer adhesion |
Li-Qun Xia, Son V. Nguyen, Shankar Venkataraman |
2009-07-21 |
| 7547643 |
Techniques promoting adhesion of porous low K film to underlying barrier layer |
Alexandros T. Demos, Derek R. Witty, Hichem M'Sadd, Sang-Hoon Ahn, Lester D'Cruz +2 more |
2009-06-16 |
| 7422776 |
Low temperature process to produce low-K dielectrics with low stress by plasma-enhanced chemical vapor deposition (PECVD) |
Kang Sub Yim, Lihua Huang, Li-Qun Xia |
2008-09-09 |
| 7273823 |
Situ oxide cap layer development |
Annamalai Lakshmanan, Daemian Raj, Bok Hoen Kim, Ganesh Balasubramanian |
2007-09-25 |
| 7259111 |
Interface engineering to improve adhesion between low k stacks |
Deenesh Padhi, Ganesh Balasubramanian, Annamalai Lakshmanan, Zhenjiang Cui, Juan Carlos Rocha-Alvarez +3 more |
2007-08-21 |
| 7226876 |
Method of modifying interlayer adhesion |
Li-Qun Xia, Son V. Nguyen, Shankar Venkataraman |
2007-06-05 |
| 7189658 |
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile |
Annamalai Lakshmanan, Deenesh Padhi, Ganesh Balasubramanian, Zhenjiang Cui, Daemian Raj +2 more |
2007-03-13 |
| 6913992 |
Method of modifying interlayer adhesion |
Li-Qun Xia, Son V. Nguyen, Shankar Venkataraman |
2005-07-05 |
