JL

Josephine Ju-Hwei Chang Liu

Applied Materials: 2 patents #3,641 of 7,310Top 50%
📍 Boise, ID: #1,893 of 3,546 inventorsTop 55%
🗺 Idaho: #3,799 of 8,810 inventorsTop 45%
Overall (All Time): #2,160,480 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7297376 Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers Kang Sub Yim, Kelvin Chan, Nagarajan Rajagopalan, Sang-Hoon Ahn, Yi Zheng +3 more 2007-11-20
7259381 Methodology for determining electron beam penetration depth Alexandros T. Demos, Hichem M'Saad 2007-08-21