| 8481422 |
Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer |
Kelvin Chan, Alexandros T. Demos, Mei-Yee Shek, Lipan Li, Li-Qun Xia +1 more |
2013-07-09 |
| 8236684 |
Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer |
Kelvin Chan, Alexandros T. Demos, Meiyee Shek, Lipan Li, Li-Qun Xia +1 more |
2012-08-07 |
| 7790583 |
Clean process for an electron beam source |
Alexandros T. Demos, Josphine J. Chang, Hichem M'Saad |
2010-09-07 |
| 7777197 |
Vacuum reaction chamber with x-lamp heater |
Amir Al-Bayati, Lester D'Cruz, Alexandros T. Demos, Dale R. DuBois, Naoyuki Iwasaki +4 more |
2010-08-17 |
| 7547643 |
Techniques promoting adhesion of porous low K film to underlying barrier layer |
Francimar Schmitt, Alexandros T. Demos, Derek R. Witty, Hichem M'Sadd, Sang-Hoon Ahn +2 more |
2009-06-16 |
| 7425716 |
Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam |
Alexandros T. Demos, Yuri Trachuk, Tom K. Cho, Girish Dixit, Hichem M'Saad +1 more |
2008-09-16 |
| 7323399 |
Clean process for an electron beam source |
Alexandros T. Demos, Josphine J. Chang, Hichem M'Saad |
2008-01-29 |
| 7045798 |
Characterizing an electron beam treatment apparatus |
Alexandros T. Demos, Hichem M'Saad |
2006-05-16 |
| 6878644 |
Multistep cure technique for spin-on-glass films |
Zhenjiang Cui, Rick J. Roberts, Michael S. Cox, Jun Zhao, Alexandros T. Demos |
2005-04-12 |
