Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8501395 | Line edge roughness reduction and double patterning | Huixiong Dai, Christopher S. Ngai | 2013-08-06 |
| 8293460 | Double exposure patterning with carbonaceous hardmask | Hui-Wan Chen, Chorng-Ping Chang, Yongmei Chen, Huixiong Dai, Jiahua Yu +7 more | 2012-10-23 |