Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for imprint lithography to facilitate dual damascene integration in a single imprint act

System and method for imprint lithography to facilitate dual damascene integration in a single imprint act

US Patent 7709373 · Granted May 4, 2010

Estimated economic value: $39,204,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for depositing amorphous silicon layers or silicon oxycarbide layers via2022
Mask for forming integrated circuit2014
Systems and methods that control liquid temperature in immersion lithography to 2013
Systems and methods that control liquid temperature in immersion lithography to 2013
Method of lithographic mask correction using localized transmission adjustment2012
Mitigating heat in an integrated circuit2011
Mitigating heat in an integrated circuit2011
System and method for imprint lithography to facilitate dual damascene integrati2011
System and method for imprint lithography to facilitate dual damascene integrati2011
Methods for forming small contacts2011
Advanced process control framework using two-dimensional image analysis2011
Surface treatment with an acidic composition to prevent substrate and environmen2010