Issued Patents All Time
Showing 51–75 of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6654660 | Controlling thermal expansion of mask substrates by scatterometry | Bhanwar Singh, Christopher F. Lyons, Bharath Rangarajan, Ramkumar Subramanian | 2003-11-25 |
| 6649525 | Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process | Jeffrey P. Erhardt, Jerry Cheng, Richard Bartlett, Anthony P. Coniglio, Wolfram Grundke +3 more | 2003-11-18 |
| 6634805 | Parallel plate development | Michael K. Templeton, Bharath Rangarajan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-21 |
| 6632283 | System and method for illuminating a semiconductor processing system | Bhanwar Singh, Bharath Rangarajan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-14 |
| 6622547 | System and method for facilitating selection of optimized optical proximity correction | Ramkumar Subramanian, Bhanwar Singh | 2003-09-23 |
| 6613500 | Reducing resist residue defects in open area on patterned wafer using trim mask | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton, Jeff P. Erhardt | 2003-09-02 |
| 6612319 | Low defect EBR nozzle | Bharath Rangarajan, Ursula Q. Quinto | 2003-09-02 |
| 6594024 | Monitor CMP process using scatterometry | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Carmen Morales | 2003-07-15 |
| 6592932 | Nozzle arm movement for resist development | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2003-07-15 |
| 6583871 | System and method to measure closed area defects | Bharath Rangarajan, Bhanwar Singh, Ramkumar Subramanian | 2003-06-24 |
| 6579651 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Bhanwar Singh, Bharath Rangarajan | 2003-06-17 |
| 6573497 | Calibration of CD-SEM by e-beam induced current measurement | Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton | 2003-06-03 |
| 6572252 | System and method for illuminating a semiconductor processing system | Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo, Ramkumar Subramanian | 2003-06-03 |
| 6573498 | Electric measurement of reference sample in a CD-SEM and method for calibration | Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton | 2003-06-03 |
| 6570157 | Multi-pitch and line calibration for mask and wafer CD-SEM system | Bhanwar Singh, Bharath Rangarajan | 2003-05-27 |
| 6563578 | In-situ thickness measurement for use in semiconductor processing | Arvind Halliyal, Bhanwar Singh | 2003-05-13 |
| 6559457 | System and method for facilitating detection of defects on a wafer | Bharath Rangarajan, Bhanwar Singh | 2003-05-06 |
| 6556303 | Scattered signal collection using strobed technique | Bharath Rangarajan, Michael K. Templeton, Bhanwar Singh | 2003-04-29 |
| 6541184 | Nozzle arm movement for resist development | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2003-04-01 |
| 6535288 | Machine readable code to trigger data collection | Bharath Rangarajan, Michael K. Templeton, Bhanwar Singh | 2003-03-18 |
| 6533865 | Acoustic/ultrasonic agitation to reduce microbubbles in developer | Bharath Rangarajan | 2003-03-18 |
| 6513151 | Full flow focus exposure matrix analysis and electrical testing for new product mask evaluation | Jeff P. Erhardt | 2003-01-28 |
| 6510730 | System and method for facilitating selection of optimized optical proximity correction | Ramkumar Subramanian, Bhanwar Singh | 2003-01-28 |
| 6507474 | Using localized ionizer to reduce electrostatic charge from wafer and mask | Bhanwar Singh, Ramkumar Subramanian, Bryan K. Choo, Bharath Rangarajan | 2003-01-14 |
| 6486072 | System and method to facilitate removal of defects from a substrate | Bharath Rangarajan, Bhanwar Singh | 2002-11-26 |