Issued Patents All Time
Showing 76–100 of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6479820 | Electrostatic charge reduction of photoresist pattern on development track | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Bryan K. Choo | 2002-11-12 |
| 6459482 | Grainless material for calibration sample | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-10-01 |
| 6453916 | Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist process | Quang N. Tran | 2002-09-24 |
| 6451512 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Bharath Rangarajan, Ramkumar Subramanian, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-09-17 |
| 6444373 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Bhanwar Singh, Bharath Rangarajan | 2002-09-03 |
| 6444381 | Electron beam flood exposure technique to reduce the carbon contamination | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan, Bryan K. Choo +1 more | 2002-09-03 |
| 6441398 | Algorithm for detecting sloped contact holes using a critical-dimension waveform | Jean Y. Yang, Ian Dudley | 2002-08-27 |
| 6423479 | Cleaning carbon contamination on mask using gaseous phase | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo | 2002-07-23 |
| 6371134 | Ozone cleaning of wafers | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo | 2002-04-16 |
| 6373053 | Analysis of CD-SEM signal to detect scummed/closed contact holes and lines | Bryan K. Choo, Bhanwar Singh, Sanjay K. Yedur | 2002-04-16 |
| 6339955 | Thickness measurement using AFM for next generation lithography | Bharath Rangarajan, Bhanwar Singh | 2002-01-22 |
| 6322009 | Common nozzle for resist development | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh | 2001-11-27 |
| 6320402 | Parallel inspection of semiconductor wafers by a plurality of different inspection stations to maximize throughput | Bernard Matt, Nicholas R. Maccrae | 2001-11-20 |
| 6316277 | Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithography | Christopher F. Lyons, Khanh B. Nguyen, Jeff Schefske | 2001-11-13 |
| 6291135 | Ionization technique to reduce defects on next generation lithography mask during exposure | Bharath Rangarajan, Bhanwar Singh | 2001-09-18 |
| 6277661 | Method for detecting sloped contact holes using a critical-dimension waveform | Jean Y. Yang, Ian Dudley | 2001-08-21 |
| 6270579 | Nozzle arm movement for resist development | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2001-08-07 |
| 6251570 | Resist developer saving system using material to reduce surface tension and wet resist surface | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh | 2001-06-26 |
| 6248175 | Nozzle arm movement for resist development | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur | 2001-06-19 |
| 6222936 | Apparatus and method for reducing defects in a semiconductor lithographic process | Gurjeet S. Bains, David A. Steele, Jonathan Alan Orth, Ramkumar Subramanian | 2001-04-24 |
| 6190062 | Cleaning chamber built into SEM for plasma or gaseous phase cleaning | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo, Sanjay K. Yedur | 2001-02-20 |
| 6171737 | Low cost application of oxide test wafer for defect monitor in photolithography process | Shobhana Punjabi, Robert J. Chiu, Bhanwar Singh | 2001-01-09 |
| 6136514 | Resist developer saving system using material to reduce surface tension and wet resist surface | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh | 2000-10-24 |
| 6063531 | Focus monitor structure and method for lithography process | Bhanwar Singh, Bharath Rangarajan, Carmen Morales | 2000-05-16 |
| 5985497 | Method for reducing defects in a semiconductor lithographic process | Gurjeet S. Bains, David A. Steele, Jonathan Alan Orth, Ramkumar Subramanian | 1999-11-16 |