Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12044981 | Method and apparatus for optimization of lithographic process | Marc Hauptmann, Everhardus Cornelis Mos, Weitian Kou, Alexander Ypma, Hyunwoo Yu +1 more | 2024-07-23 |
| 11782349 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Weitian Kou, Alexander Ypma, Marc Hauptmann, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos +8 more | 2023-10-10 |
| 11774862 | Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus | Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Elliott Gerard McNamara +3 more | 2023-10-03 |
| 11592753 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Weitian Kou, Alexander Ypma, Marc Hauptmann, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos +8 more | 2023-02-28 |
| 11327407 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Weitian Kou, Alexander Ypma, Marc Hauptmann, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos +8 more | 2022-05-10 |
| 11175591 | Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus | Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Elliott Gerard McNamara +3 more | 2021-11-16 |
| 11099487 | Method and apparatus for optimization of lithographic process | Marc Hauptmann, Everhardus Cornelis Mos, Weitian Kou, Alexander Ypma, Hyunwoo Yu +1 more | 2021-08-24 |
| 10908512 | Methods of controlling a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Daan Maurits Slotboom | 2021-02-02 |
| 10877381 | Methods of determining corrections for a patterning process | Weitian Kou, Alexander Ypma, Marc Hauptmann, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos +8 more | 2020-12-29 |
| 10281825 | Method of sequencing lots for a lithographic apparatus | Wolfgang Henke | 2019-05-07 |
| 8440475 | Alignment calculation | Boris Habets, Wolfgang Henke | 2013-05-14 |
| 7783444 | Systems and methods of alternative overlay calculation | Boris Habets | 2010-08-24 |