Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12416868 | Non-correctable error in metrology | Arie Van Den Brin | 2025-09-16 |
| 12287582 | Method for controlling a lithographic apparatus and associated apparatuses | Frank Staals | 2025-04-29 |
| 12197136 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2025-01-14 |
| 12169366 | Voltage contrast metrology mark | Cyrus E. Tabery, Simon Philip Spencer Hastings, Brennan Peterson | 2024-12-17 |
| 11768442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2023-09-26 |
| 11714357 | Method to predict yield of a device manufacturing process | Alexander Ypma, Cyrus E. Tabery, Chenxi Lin, Dag Sonntag, Hakki Ergün Cekli +9 more | 2023-08-01 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2022-11-29 |
| 11194258 | Method and apparatus for determining a fingerprint of a performance parameter | Léon Maria Albertus Van Der Logt, Bart Peter Bert Segers, Carlo Cornelis Maria Luijten, Frank Staals | 2021-12-07 |
| 11181829 | Method for determining a control parameter for an apparatus utilized in a semiconductor manufacturing process | Cyrus E. Tabery, Hakki Ergün Cekli, Chenxi Lin | 2021-11-23 |
| 11086229 | Method to predict yield of a device manufacturing process | Alexander Ypma, Cyrus E. Tabery, Chenxi Lin, Dag Sonntag, Hakki Ergün Cekli +9 more | 2021-08-10 |
| 10649342 | Method and apparatus for determining a fingerprint of a performance parameter | Léon Maria Albertus Van Der Logt, Bart Peter Bert Segers, Carlo Cornelis Maria Luijten, Frank Staals | 2020-05-12 |