Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11385554 | Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate | Steven E. Steen, Eric Brouwer, Bart Peter Bert Segers, Pierre-Yves Guittet, Frank Staals +1 more | 2022-07-12 |
| 10895811 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Elliott Gerard MC NAMARA, Pierre-Yves Guittet, Eric Brouwer, Bart Peter Bert Segers | 2021-01-19 |
| 10871716 | Metrology robustness based on through-wavelength similarity | Christian Marinus Leewis, Frank Staals | 2020-12-22 |
| 10571812 | Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method | Fahong Li, Carlo Cornelis Maria Luijten, Bart Peter Bert Segers, Cornelis Andreas Franciscus Johannes Van Der Poel, Frank Staals +2 more | 2020-02-25 |
| 10394132 | Metrology robustness based on through-wavelength similarity | Christian Marinus Leewis, Frank Staals | 2019-08-27 |
| 9518936 | Method and apparatus for determining lithographic quality of a structure | Willem Jan Grootjans, Henricus Johannes Lambertus Megens, Jouke Krist, Lu Xu | 2016-12-13 |