PG

Pierre-Yves Guittet

AB Asml Netherlands B.V.: 4 patents #960 of 3,192Top 35%
Infineon Technologies Ag: 3 patents #2,452 of 7,486Top 35%
NG Nanda Technologies Gmbh: 3 patents #5 of 11Top 50%
IM Imec: 1 patents #297 of 687Top 45%
NT Nanya Technology: 1 patents #447 of 775Top 60%
📍 Dresden, DE: #227 of 3,254 inventorsTop 7%
Overall (All Time): #496,071 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
11714357 Method to predict yield of a device manufacturing process Alexander Ypma, Cyrus E. Tabery, Simon Hendrik Celine Van Gorp, Chenxi Lin, Dag Sonntag +9 more 2023-08-01
11385554 Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate Miguel GARCIA GRANDA, Steven E. Steen, Eric Brouwer, Bart Peter Bert Segers, Frank Staals +1 more 2022-07-12
11086229 Method to predict yield of a device manufacturing process Alexander Ypma, Cyrus E. Tabery, Simon Hendrik Celine Van Gorp, Chenxi Lin, Dag Sonntag +9 more 2021-08-10
10895811 Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method Miguel GARCIA GRANDA, Elliott Gerard MC NAMARA, Eric Brouwer, Bart Peter Bert Segers 2021-01-19
8778702 Method of inspecting and processing semiconductor wafers Lars Markwort, Reza Kharrazian, Christoph Kappel 2014-07-15
8501503 Methods of inspecting and manufacturing semiconductor wafers Lars Markwort 2013-08-06
8460946 Methods of processing and inspecting semiconductor substrates Lars Markwort, Sandip Halder, Anne Jourdain 2013-06-11
7405089 Method and apparatus for measuring a surface profile of a sample Harald Bloess, Uwe Wellhausen, Peter Reinig, Peter Weidner, Ulrich Mantz 2008-07-29
7372579 Apparatus and method for monitoring trench profiles and for spectrometrologic analysis Zhen Chen, Peter Weidner, Alexander Kasic, Barbara Schmidt, Anita Klee 2008-05-13
7262837 Noninvasive method for characterizing and identifying embedded micropatterns Ulrich Mantz, Eckhard Marx 2007-08-28