PK

Pieter Kruit

MB Mapper Lithography Ip B.V.: 47 patents #2 of 84Top 3%
TD Technische Universiteit Delft: 13 patents #1 of 311Top 1%
U.S. Philips: 8 patents #426 of 8,851Top 5%
Applied Materials: 6 patents #1,918 of 7,310Top 30%
FE Fei: 3 patents #184 of 681Top 30%
AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
EL Elith: 2 patents #1 of 14Top 8%
DB Delmic Ip B.V.: 2 patents #4 of 6Top 70%
HH Hitachi High-Technologies: 2 patents #456 of 1,200Top 40%
AG Agere Systems Guardian: 1 patents #274 of 810Top 35%
AS Agere Systems: 1 patents #984 of 1,849Top 55%
AT AT&T: 1 patents #10,626 of 18,772Top 60%
Overall (All Time): #17,412 of 4,157,543Top 1%
91
Patents All Time

Issued Patents All Time

Showing 25 most recent of 91 patents

Patent #TitleCo-InventorsDate
12412727 Charged particle beam system, corrector for aberration correction of a charged particle beam, and method thereof John Breuer 2025-09-09
RE50540 Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope Jacob Pieter Hoogenboom, Nalan Liv Hamarat 2025-08-19
12362131 Method for inspecting a specimen and charged particle beam device Ron Naftali, Jürgen Frosien, Ralf Schmid, Benjamin John Cook, Roman Barday +1 more 2025-07-15
12224152 Multi-beam charged particle source with alignment means 2025-02-11
12062519 Beam deflection device, aberration corrector, monochromator, and charged particle beam device Hideto Dohi 2024-08-13
11961709 Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets Ali Mohammadi-Gheidari, Erik René Kieft 2024-04-16
RE49602 Lithography system, sensor and measuring method Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink 2023-08-08
RE49488 Lithography system, method of clamping and wafer table Guido De Boer, Michel Pieter Dansberg 2023-04-11
10903042 Apparatus and method for inspecting a sample using a plurality of charged particle beams Aernout Christiaan Zonnevylle, Yan Ren 2021-01-26
RE48046 Lithography system, sensor and measuring method Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink 2020-06-09
10679819 Aberration correcting device for an electron microscope and an electron microscope comprising such a device 2020-06-09
10651009 Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope Jacob Pieter Hoogenboom, Nalan Liv Hamarat 2020-05-12
10504687 Signal separator for a multi-beam charged particle inspection apparatus Ron Naftali 2019-12-10
10453645 Method for inspecting a specimen and charged particle multi-beam device Jürgen Frosien 2019-10-22
10453649 Apparatus and method for inspecting a sample using a plurality of charged particle beams Aernout Christiaan Zonnevylle, Yan Ren 2019-10-22
10395887 Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column Ron Naftali 2019-08-27
10312052 Multi electron beam inspection apparatus 2019-06-04
10132753 Method and apparatus for determining a density of fluorescent markers in a sample Jacob Pieter Hoogenboom 2018-11-20
9922796 Method for inspecting a specimen and charged particle multi-beam device Jürgen Frosien 2018-03-20
9715992 Integrated optical and charged particle inspection apparatus Jacob Pieter Hoogenboom, Nalan Liv, Aernout Christiaan Zonnevylle 2017-07-25
9697985 Apparatus and method for inspecting a surface of a sample Ali Mohammadi-Gheidari, Yan Ren 2017-07-04
9665013 Lithography system, method of clamping and wafer table Guido De Boer, Michel Pieter Dansberg 2017-05-30
9645511 Lithography system, method of clamping and wafer table Guido De Boer, Michel Pieter Dansberg 2017-05-09
9607806 Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams Aernout Christiaan Zonnevylle 2017-03-28
9484187 Arrangement for transporting radicals Marc Smits 2016-11-01