| 12394589 |
Charged particle device, detector, and methods |
Albertus Victor Gerardus MANGNUS |
2025-08-19 |
| RE49952 |
Beam grid layout |
Vincent Sylvester Kuiper |
2024-04-30 |
| RE49732 |
Charged particle lithography system with alignment sensor and beam measurement sensor |
Paul IJmert Scheffers, Jan Andries Meijer, Vincent Sylvester Kuiper, Niels Vergeer |
2023-11-21 |
| RE49602 |
Lithography system, sensor and measuring method |
Pieter Kruit, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink |
2023-08-08 |
| RE48903 |
Apparatus for transferring a substrate in a lithography system |
Vincent Sylvester Kuiper, Marcel Nicolaas Jacobus van Kervinck, Guido De Boer, Hendrik Jan De Jong |
2022-01-25 |
| RE48046 |
Lithography system, sensor and measuring method |
Pieter Kruit, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink |
2020-06-09 |
| 9934943 |
Beam grid layout |
Vincent Sylvester Kuiper |
2018-04-03 |
| 9665014 |
Charged particle lithography system with alignment sensor and beam measurement sensor |
Paul IJmert Scheffers, Jan Andries Meijer, Vincent Sylvester Kuiper, Niels Vergeer |
2017-05-30 |
| 9575418 |
Apparatus for transferring a substrate in a lithography system |
Vincent Sylvester Kuiper, Marcel Nicolaas Jacobus van Kervinck, Guido De Boer, Hendrik Jan De Jong |
2017-02-21 |
| 9244726 |
Network architecture for lithography machine cluster |
Marcel Nicolaas Jacobus van Kervinck, Vincent Sylvester Kuiper |
2016-01-26 |
| 9176397 |
Apparatus for transferring a substrate in a lithography system |
Vincent Sylvester Kuiper, Marcel Nicolaas Jacobus van Kervinck, Guido De Boer, Hendrik Jan De Jong |
2015-11-03 |
| 8936994 |
Method of processing a substrate in a lithography system |
Vincent Sylvester Kuiper, Marcel Nicolaas Jacobus van Kervinck, Guido De Boer, Hendrik Jan De Jong |
2015-01-20 |
| 8895943 |
Lithography system and method of processing substrates in such a lithography system |
Guido De Boer, Hendrik Jan De Jong, Vincent Sylvester Kuiper |
2014-11-25 |
| RE45206 |
Lithography system, sensor and measuring method |
Pieter Kruit, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijin Willem Herman Karel Steenbrink |
2014-10-28 |
| 7868300 |
Lithography system, sensor and measuring method |
Pieter Kruit, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink |
2011-01-11 |