Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper, Niels Vergeer | 2023-11-21 |
| RE49483 | Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus | — | 2023-04-04 |
| 9829804 | Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system | Jerry Johannes Martinus Peijster | 2017-11-28 |
| 9665014 | Charged particle lithography system with alignment sensor and beam measurement sensor | Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper, Niels Vergeer | 2017-05-30 |
| 9653259 | Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus | — | 2017-05-16 |
| 9240306 | Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device | Jan Andries Meijer, Abdourahmane Ange Sarr | 2016-01-19 |
| 9153415 | Charged particle lithography system with sensor assembly | — | 2015-10-06 |