Issued Patents All Time
Showing 51–75 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8153991 | Direct write lithography system | — | 2012-04-10 |
| 8134135 | Multiple beam charged particle optical system | Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink | 2012-03-13 |
| 8089056 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2012-01-03 |
| 7868307 | Charged particle beam exposure system | — | 2011-01-11 |
| 7868300 | Lithography system, sensor and measuring method | Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink | 2011-01-11 |
| 7859760 | Method and apparatus for imaging | Bob Van Someren | 2010-12-28 |
| 7842936 | Lithography system and projection method | Remco Jager, Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland | 2010-11-30 |
| 7772564 | Particle-optical apparatus equipped with a gas ion source | Vipin Nagnath Tondare | 2010-08-10 |
| 7732762 | Method of inspecting a specimen surface, apparatus and use of fluorescent material | Michiel David Nijkerk | 2010-06-08 |
| 7710009 | System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission | Stijn Willem Herman Karel Steenbrink | 2010-05-04 |
| 7612866 | Lithography system | Jan-Jaco Marco Wieland, Johannes van't Spijker, Remco Jager | 2009-11-03 |
| 7569833 | Apparatus for generating a plurality of beamlets | — | 2009-08-04 |
| 7453075 | Charged particle beam exposure system | — | 2008-11-18 |
| 7391037 | Apparatus for generating a plurality of beamlets | — | 2008-06-24 |
| 7365338 | Apparatus for generating a plurality of beamlets | — | 2008-04-29 |
| 7348567 | Apparatus for generating a plurality of beamlets | — | 2008-03-25 |
| 7345290 | Lens array for electron beam lithography tool | Victor Katsap, Daniel Moonen, Warren K. Waskiewicz | 2008-03-18 |
| 7215070 | System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission | Stijn Willem Herman Karel Steenbrink | 2007-05-08 |
| 7173263 | Optical switching in lithography system | Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager | 2007-02-06 |
| 7129502 | Apparatus for generating a plurality of beamlets | — | 2006-10-31 |
| 7102732 | Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element | Pieter Willem Herman De Jager, Arno Jan Bleeker, Karel Diederick Van Der Mast | 2006-09-05 |
| 7091504 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen | 2006-08-15 |
| 7084414 | Charged particle beamlet exposure system | Marco Jan-Jaco Wieland | 2006-08-01 |
| 7019312 | Adjustment in a MAPPER system | — | 2006-03-28 |
| 6958804 | Lithography system | Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager | 2005-10-25 |