Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387903 | Aberration correction in charged particle system | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2025-08-12 |
| 12327707 | Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus | Derk Ferdinand WALVOORT | 2025-06-10 |
| 11961627 | Vacuum chamber arrangement for charged particle beam generator | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2024-04-16 |
| 11728123 | Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus | Derk Ferdinand WALVOORT | 2023-08-15 |
| 11705252 | Vacuum chamber arrangement for charged particle beam generator | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2023-07-18 |
| 11348756 | Aberration correction in charged particle system | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2022-05-31 |
| 11101099 | Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus | Derk Ferdinand WALVOORT | 2021-08-24 |
| 11094426 | Vacuum chamber arrangement for charged particle beam generator | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2021-08-17 |
| 10586625 | Vacuum chamber arrangement for charged particle beam generator | Willem Henk Urbanus, Marco Jan-Jaco Wieland | 2020-03-10 |
| 10037864 | High voltage shielding and cooling in a charged particle beam generator | Willem Henk Urbanus | 2018-07-31 |
| 9653261 | Charged particle lithography system and beam generator | Willem Henk Urbanus | 2017-05-16 |
| 9208989 | Lithography system and method of refracting | Yanxia Zhang, Gun Sari Mari Berglund, Pieter Kruit | 2015-12-08 |
| 9105439 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Pieter Kruit, Stijn Willem Herman Karel Steenbrink | 2015-08-11 |
| 8921758 | Modulation device and charged particle multi-beamlet lithography system using the same | Marco Jan-Jaco Wieland, Teunis Van De Peut, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle +1 more | 2014-12-30 |
| 8890094 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Pieter Kruit, Stijn Willem Herman Karel Steenbrink | 2014-11-18 |
| 8841636 | Modulation device and charged particle multi-beamlet lithography system using the same | Marco Jan-Jaco Wieland, Remco Jager, Stijn Willem Herman Karel Steenbrink | 2014-09-23 |
| RE45049 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Pieter Kruit | 2014-07-29 |
| 8759787 | Charged particle multi-beamlet lithography system with modulation device | Marco Jan-Jaco Wieland, Remco Jager, Stijn Willem Herman Karel Steenbrink | 2014-06-24 |
| RE44908 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Pieter Kruit | 2014-05-27 |
| 8653485 | Projection lens arrangement | Marco Jan-Jaco Wieland | 2014-02-18 |
| 8618496 | Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams | Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink, Alrik van den Brom | 2013-12-31 |
| 8604411 | Charged particle beam modulator | Marco Jan-Jaco Wieland, Remco Jager, Stijn Willem Herman Karel Steenbrink, Teunis Van De Peut, Henk Derks | 2013-12-10 |
| 8558196 | Charged particle lithography system with aperture array cooling | Marco Jan-Jaco Wieland, Hendrik Jan De Jong | 2013-10-15 |
| 8502176 | Imaging system | Marco Jan-Jaco Wieland | 2013-08-06 |
| 8492731 | Charged particle multi-beamlet lithography system with modulation device | Marco Jan-Jaco Wieland, Remco Jager, Stijn Willem Herman Karel Steenbrink | 2013-07-23 |