Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387903 | Aberration correction in charged particle system | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2025-08-12 |
| 11961627 | Vacuum chamber arrangement for charged particle beam generator | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2024-04-16 |
| 11705252 | Vacuum chamber arrangement for charged particle beam generator | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2023-07-18 |
| 11348756 | Aberration correction in charged particle system | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2022-05-31 |
| 11094426 | Vacuum chamber arrangement for charged particle beam generator | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2021-08-17 |
| 10586625 | Vacuum chamber arrangement for charged particle beam generator | Alexander Hendrik Vincent Van Veen, Marco Jan-Jaco Wieland | 2020-03-10 |
| 10037864 | High voltage shielding and cooling in a charged particle beam generator | Alexander Hendrik Vincent Van Veen | 2018-07-31 |
| 9905322 | Multi-electrode electron optics | Marco Jan-Jaco Wieland | 2018-02-27 |
| 9653261 | Charged particle lithography system and beam generator | Alexander Hendrik Vincent Van Veen | 2017-05-16 |
| 9355751 | Multi-electrode stack arrangement | Marco Jan-Jaco Wieland | 2016-05-31 |
| 9165693 | Multi-electrode cooling arrangement | Marco Jan-Jaco Wieland | 2015-10-20 |
| 8916837 | Charged particle lithography system with intermediate chamber | Laura Dinu-Gürtler, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink | 2014-12-23 |
| 8586949 | Charged particle lithography system with intermediate chamber | Laura Dinu-Gürtler, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink | 2013-11-19 |