Issued Patents All Time
Showing 26–50 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9449789 | Apparatus and method for inspecting a surface of a sample | — | 2016-09-20 |
| 9378921 | Integrated optical and charged particle inspection apparatus | Jacob Pieter Hoogenboom, Aernout Christiaan Zonnevylle, Angela Carolina Narváez-González | 2016-06-28 |
| 9208989 | Lithography system and method of refracting | Alexander Hendrik Vincent Van Veen, Yanxia Zhang, Gun Sari Mari Berglund | 2015-12-08 |
| 9123507 | Arrangement and method for transporting radicals | Marc Smits | 2015-09-01 |
| 9105439 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2015-08-11 |
| RE45552 | Lithography system and projection method | Remco Jager, Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland | 2015-06-09 |
| 8895921 | Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus | Jacob Pieter Hoogenboom, Aernout Christiaan Zonnevylle | 2014-11-25 |
| 8890095 | Reliability in a maskless lithography system | Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland | 2014-11-18 |
| 8890094 | Projection lens arrangement | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink | 2014-11-18 |
| RE45206 | Lithography system, sensor and measuring method | Erwin Slot, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijin Willem Herman Karel Steenbrink | 2014-10-28 |
| RE45049 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen | 2014-07-29 |
| RE44908 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen | 2014-05-27 |
| 8705010 | Lithography system, method of clamping and wafer table | Guido De Boer, Michel Pieter Dansberg | 2014-04-22 |
| 8648318 | Multiple beam charged particle optical system | Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink | 2014-02-11 |
| 8610093 | Direct write lithography system | — | 2013-12-17 |
| 8598545 | Multiple beam charged particle optical system | Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink | 2013-12-03 |
| 8569712 | Beam blanker for interrupting a beam of charged particles | Guido Knippels, Fredericus Bernardus Kiewiet, Hendrik Nicolaas Slingerland, Benjamin John Cook, Jacques Nonhebel | 2013-10-29 |
| 8525134 | Lithography system | Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager | 2013-09-03 |
| RE44240 | Electron beam exposure system | Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen | 2013-05-28 |
| 8325321 | Lithography system, method of heat dissipation and frame | Michel Pieter Dansberg, Marco Jan-Jaco Wieland | 2012-12-04 |
| 8294117 | Multiple beam charged particle optical system | Aernout Christiaan Zonnevylle | 2012-10-23 |
| 8263942 | System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission | Stijn Willem Herman Karel Steenbrink | 2012-09-11 |
| 8247958 | System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission | Stijn Willem Herman Karel Steenbrink | 2012-08-21 |
| 8242470 | Optical switching in a lithography system | Marco Jan-Jaco Wieland, Johannes Christiaan van 't Spijker, Remco Jager | 2012-08-14 |
| 8188450 | Multiple beam charged particle optical system | Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink | 2012-05-29 |