Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7580559 | System and method for calibrating a spatial light modulator | Sherman K. Poultney | 2009-08-25 |
| 7542013 | System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode | Wenceslao A. Cebuhar, Jason Hintersteiner | 2009-06-02 |
| 7469058 | Method and system for a maskless lithography rasterization technique based on global optimization | Sherman K. Poultney, Wenceslao A. Cebuhar | 2008-12-23 |
| 7463402 | Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography | Wenceslao A. Cebuhar, Jason Hintersteiner, Gerald Volpe | 2008-12-09 |
| 7423732 | Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane | Matthew Lipson | 2008-09-09 |
| 7410736 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones | Arno Jan Bleeker, Wenceslao A. Cebuhar | 2008-08-12 |
| 7394584 | System and method for calculating aerial image of a spatial light modulator | — | 2008-07-01 |
| 7259831 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation | Karel Diederick Van Der Mast | 2007-08-21 |
| 7209275 | Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation | Kars Troost, Johannes Jacobus Matheus Baselmans | 2007-04-24 |
| 7158238 | System and method for calibrating a spatial light modulator array using shearing interferometry | Sherman K. Poultney | 2007-01-02 |
| 7133121 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Yuli Vladimirsky | 2006-11-07 |
| 7102733 | System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool | Christopher Mason, Sherman K. Poultney, Arno Jan Bleeker | 2006-09-05 |
| 7023526 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation | Karel Diederick Van Der Mast | 2006-04-04 |
| 6985280 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Wenceslao A. Cebuhar, Jason Hintersteiner, Gerald Volpe | 2006-01-10 |
| 6965436 | System and method for calibrating a spatial light modulator array using shearing interferometry | Sherman K. Poultney | 2005-11-15 |
| 6963434 | System and method for calculating aerial image of a spatial light modulator | — | 2005-11-08 |
| 6876440 | METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Yuli Vladimirsky | 2005-04-05 |
| 6847461 | System and method for calibrating a spatial light modulator array using shearing interferometry | Sherman K. Poultney | 2005-01-25 |
| 6831768 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Wenceslao A. Cebuhar, Jason Hintersteiner, Gerald Volpe | 2004-12-14 |
| 6275770 | Method to remove station-induced error pattern from measured object characteristics and compensate the measured object characteristics with the error | — | 2001-08-14 |