Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8739098 | EUV mask defect reconstruction and compensation repair | Christopher Heinz Clifford, Fan Jiang | 2014-05-27 |
| 7378197 | Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC | James R. Wasson | 2008-05-27 |
| 7026076 | Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC | James R. Wasson | 2006-04-11 |
| 6986971 | Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same | Sang In Han, Scott D. Hector | 2006-01-17 |
| 6986974 | Attenuated phase shift mask for extreme ultraviolet lithography and method therefore | Sang In Han, Scott D. Hector | 2006-01-17 |
| 6939650 | Method of patterning photoresist on a wafer using a transmission mask with a carbon layer | James R. Wasson | 2005-09-06 |
| 6875546 | Method of patterning photoresist on a wafer using an attenuated phase shift mask | James R. Wasson | 2005-04-05 |
| 6797440 | Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device | Cesar M. Garza, Wei E. Wu, Bernard J. Roman, Kevin J. Nordquist, William J. Dauksher | 2004-09-28 |
| 6749968 | Method for fabricating a thin-membrane stencil mask and method for making a semiconductor device using the same | Joe Mogab, Kenneth Smith, James R. Wasson | 2004-06-15 |
| 6673520 | Method of making an integrated circuit using a reflective mask | Sang In Han, James R. Wasson, Scott D. Hector | 2004-01-06 |
| 6653053 | Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask | Sang In Han | 2003-11-25 |
| 6596465 | Method of manufacturing a semiconductor component | James R. Wasson, Scott D. Hector | 2003-07-22 |
| 6477898 | Membrane mask stress measurement apparatus and method therefor | Sang In Han | 2002-11-12 |
| 6352803 | Coatings on reflective mask substrates | William M. Tong, John S. Taylor, Scott D. Hector, Alan Stivers, Patrick G. Kofron +1 more | 2002-03-05 |
| 6297169 | Method for forming a semiconductor device using a mask having a self-assembled monolayer | C. Joseph Mogab, Kevin Cummings, Allison M. Fisher | 2001-10-02 |
| 6221537 | Method of forming mask with angled struts of reduced height | Matthew A. Thompson | 2001-04-24 |
| 6177354 | Method of etching a substrate | Philip Armin Seese, William J. Dauksher | 2001-01-23 |
| 6124063 | Method of forming a semiconductor device utilizing lithographic mask and mask therefor | William J. Dauksher, Roy Allen Huston | 2000-09-26 |
| 6039835 | Etching apparatus and method of etching a substrate | Philip Armin Seese, William J. Dauksher | 2000-03-21 |
| 5989760 | Method of processing a substrate utilizing specific chuck | William J. Dauksher | 1999-11-23 |
| 5942760 | Method of forming a semiconductor device utilizing scalpel mask, and mask therefor | Matthew A. Thompson | 1999-08-24 |
| 5899728 | Method of forming a lithographic mask | William J. Dauksher | 1999-05-04 |