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Methods of fluorinating filters used in the manufacture of a semiconductor device |
— |
2020-09-29 |
| 7901852 |
Metrology of bilayer photoresist processes |
Sungseo Cho |
2011-03-08 |
| 7157377 |
Method of making a semiconductor device using treated photoresist |
William D. Darlington, Stanley M. Filipiak, James E. Vasek |
2007-01-02 |
| 6849515 |
Semiconductor process for disposable sidewall spacers |
William J. Taylor, Jr. |
2005-02-01 |
| 6797440 |
Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
Wei E. Wu, Bernard J. Roman, Pawitter Mangat, Kevin J. Nordquist, William J. Dauksher |
2004-09-28 |
| 6649452 |
Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer |
Kevin Lucas, William L. Wilkinson |
2003-11-18 |
| 6593033 |
Attenuated rim phase shift mask |
Zhiliu Ma, Anthony Yen |
2003-07-15 |
| 5716738 |
Dark rims for attenuated phase shift mask |
— |
1998-02-10 |
| 5094936 |
High pressure photoresist silylation process and apparatus |
George R. Misium, Cecil J. Davis |
1992-03-10 |
| 5085729 |
Uniformity using stagnant silylation |
Ricky Alan Jackson, Ryan Priebe |
1992-02-04 |
| 4891303 |
Trilayer microlithographic process using a silicon-based resist as the middle layer |
Monte A. Douglas, Roland E. Johnson |
1990-01-02 |
| 4882008 |
Dry development of photoresist |
Monte A. Douglas, Lee M. Loewenstein, Cecil J. Davis |
1989-11-21 |
| 4770739 |
Bilayer photoresist process |
Kevin J. Orvek |
1988-09-13 |
