SH

Sang In Han

KC Kolmar Korea Co.: 6 patents #7 of 39Top 20%
FS Freeescale Semiconductor: 5 patents #628 of 3,767Top 20%
Motorola: 3 patents #3,303 of 12,470Top 30%
YC Yonwoo Co.: 2 patents #29 of 64Top 50%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Wolha-ri, IL: #2 of 2 inventorsTop 100%
Overall (All Time): #188,680 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
D1064841 Packaging container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2025-03-04
12006117 Container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2024-06-11
D1019386 Spout for packaging container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2024-03-26
11919688 Content container Chang-Soo Lee, Koo Sup Ahn, Jong-Hyun Park, Hye-Jin Jung 2024-03-05
D1008799 Spout for packaging container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2023-12-26
11827437 Container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2023-11-28
D993041 Packaging container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2023-07-25
D988876 Packaging container Chang-Soo Lee, Hye-Jin Jung, Hee Yoon Kim 2023-06-13
11654227 Wet seal suction device Eugene Han, Rebecca Han 2023-05-23
D974182 Packaging pouch Chang Soo Yi, Hye-Jin Jung, Hee Yoon Kim 2023-01-03
9164757 Image forming apparatus, tracking apparatus, managing apparatus and method of updating firmware of image forming apparatus 2015-10-20
7282307 Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same Scott D. Hector 2007-10-16
6986974 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore Scott D. Hector, Pawitter Mangat 2006-01-17
6986971 Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same Scott D. Hector, Pawitter Mangat 2006-01-17
6960509 Method of fabricating three dimensional gate structure using oxygen diffusion Kurt Eisenbeiser, Bing Lu 2005-11-01
6811936 Structure and process for a pellicle membrane for 157 nanometer lithography Steven D. Smith 2004-11-02
6673520 Method of making an integrated circuit using a reflective mask Pawitter Mangat, James R. Wasson, Scott D. Hector 2004-01-06
6653053 Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask Pawitter Mangat 2003-11-25
6477898 Membrane mask stress measurement apparatus and method therefor Pawitter Mangat 2002-11-12
5365625 Ring cutting and removing device 1994-11-22
5312346 Needle removing device 1994-05-17
5133701 Disposable pressure wound irrigation device 1992-07-28