| 8881068 |
Optimized optical proximity correction handling for lithographic fills |
Pavan Y. Bashaboina |
2014-11-04 |
| 8739077 |
Methods of modifying a physical design of an electrical circuit used in the manufacture of a semiconductor device |
Piyush Pathak, Piyush Verma |
2014-05-27 |
| 7108946 |
Method of lithographic image alignment for use with a dual mask exposure technique |
Todd P. Lukanc, Bhanwar Singh, Joerg Reiss |
2006-09-19 |
| 7071085 |
Predefined critical spaces in IC patterning to reduce line end pull back |
Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Joerg Reiss |
2006-07-04 |
| 7027130 |
Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
Christopher A. Spence, Todd P. Lukanc, Luigi Capodieci, Joerg Reiss |
2006-04-11 |
| 7015148 |
Reduce line end pull back by exposing and etching space after mask one trim and etch |
Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Joerg Reiss |
2006-03-21 |
| 6995433 |
Microdevice having non-linear structural component and method of fabrication |
Todd P. Lukanc, Luigi Capodieci, Bhanwar Singh, Joerg Reiss |
2006-02-07 |
