Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7108946 | Method of lithographic image alignment for use with a dual mask exposure technique | Todd P. Lukanc, Sarah N. McGowan, Bhanwar Singh | 2006-09-19 |
| 7091088 | UV-blocking etch stop layer for reducing UV-induced charging of charge storage layer in memory devices in BEOL processing | Ning Cheng, Clarence B. Ferguson, Emmanuil H. Lingunis, Minh Van Ngo, Jean Y. Yang +2 more | 2006-08-15 |
| 7071085 | Predefined critical spaces in IC patterning to reduce line end pull back | Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Sarah N. McGowan | 2006-07-04 |
| 7027130 | Device and method for determining an illumination intensity profile of an illuminator for a lithography system | Christopher A. Spence, Todd P. Lukanc, Luigi Capodieci, Sarah N. McGowan | 2006-04-11 |
| 7015148 | Reduce line end pull back by exposing and etching space after mask one trim and etch | Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Sarah N. McGowan | 2006-03-21 |
| 6995433 | Microdevice having non-linear structural component and method of fabrication | Todd P. Lukanc, Sarah N. McGowan, Luigi Capodieci, Bhanwar Singh | 2006-02-07 |