| 7108946 |
Method of lithographic image alignment for use with a dual mask exposure technique |
Todd P. Lukanc, Sarah N. McGowan, Bhanwar Singh |
2006-09-19 |
| 7091088 |
UV-blocking etch stop layer for reducing UV-induced charging of charge storage layer in memory devices in BEOL processing |
Ning Cheng, Clarence B. Ferguson, Emmanuil H. Lingunis, Minh Van Ngo, Jean Y. Yang +2 more |
2006-08-15 |
| 7071085 |
Predefined critical spaces in IC patterning to reduce line end pull back |
Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Sarah N. McGowan |
2006-07-04 |
| 7027130 |
Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
Christopher A. Spence, Todd P. Lukanc, Luigi Capodieci, Sarah N. McGowan |
2006-04-11 |
| 7015148 |
Reduce line end pull back by exposing and etching space after mask one trim and etch |
Todd P. Lukanc, Luigi Capodieci, Christopher A. Spence, Sarah N. McGowan |
2006-03-21 |
| 6995433 |
Microdevice having non-linear structural component and method of fabrication |
Todd P. Lukanc, Sarah N. McGowan, Luigi Capodieci, Bhanwar Singh |
2006-02-07 |