Issued Patents All Time
Showing 26–50 of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7285499 | Polymer spacers for creating sub-lithographic spaces | Phillip Jones, Angela T. Hui | 2007-10-23 |
| 7268066 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more | 2007-09-11 |
| 7122455 | Patterning with rigid organic under-layer | Christopher F. Lyons, Marina V. Plat, Srikanteswara Dakshina-Murthy, Cyrus E. Tabery | 2006-10-17 |
| 7084071 | Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenon | Srikanteswara Dakshina-Murthy, Richard J. Huang, Richard Nguyen, Cyrus E. Tabery | 2006-08-01 |
| 7077291 | Package assembly with foamed topping | James E. Hawes | 2006-07-18 |
| 7052921 | System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process | Marina V. Plat, Bhanwar Singh, Calvin T. Gabriel, Christopher F. Lyons, Ramkumar Subramanian +1 more | 2006-05-30 |
| 7005386 | Method for reducing resist height erosion in a gate etch process | Srikanteswara Dakshina-Murthy, Chih-Yuh Yang, Ashok M. Khathuria | 2006-02-28 |
| 6989332 | Ion implantation to modulate amorphous carbon stress | Srikanteswara Dakshina-Murthy, Christopher F. Lyons | 2006-01-24 |
| 6900002 | Antireflective bi-layer hardmask including a densified amorphous carbon layer | Marina V. Plat, Marilyn I. Wright, Lu You | 2005-05-31 |
| 6884733 | Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation | Srikanteswara Dakshina-Murthy, David E. Brown, Philip A. Fisher | 2005-04-26 |
| 6875668 | Notched gate structure fabrication | Khanh B. Nguyen | 2005-04-05 |
| 6864556 | CVD organic polymer film for advanced gate patterning | Lu You, Marina V. Plat, Chih-Yuh Yang, Richard J. Huang, Christopher F. Lyons +2 more | 2005-03-08 |
| 6855627 | Method of using amorphous carbon to prevent resist poisoning | Srikanteswara Dakshina-Murthy, Richard J. Huang, Richard Nguyen, Cyrus E. Tabery | 2005-02-15 |
| 6849530 | Method for semiconductor gate line dimension reduction | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Srikanteswara Dakshina-Murthy, Philip A. Fisher +1 more | 2005-02-01 |
| 6803178 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Todd P. Lukanc, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim | 2004-10-12 |
| 6797552 | Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices | Mark S. Chang, Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Srikanteswara Dakshina-Murthy | 2004-09-28 |
| 6773998 | Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning | Philip A. Fisher, Marina V. Plat, Chih-Yuh Yang, Christopher F. Lyons, Douglas J. Bonser +2 more | 2004-08-10 |
| 6764949 | Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication | Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Darin A. Chan, Philip A. Fisher +6 more | 2004-07-20 |
| 6764947 | Method for reducing gate line deformation and reducing gate line widths in semiconductor devices | Darin A. Chan, Douglas J. Bonser, Marina V. Plat, Marilyn I. Wright, Chih-Yuh Yang +2 more | 2004-07-20 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Todd P. Lukanc, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2004-06-22 |
| 6750127 | Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance | Mark S. Chang, Darin A. Chan, Chih-Yuh Yang, Lu You, Srikanteswara Dakshina-Murthy +1 more | 2004-06-15 |
| 6740566 | Ultra-thin resist shallow trench process using high selectivity nitride etch | Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2004-05-25 |
| 6737222 | Dual damascene process utilizing a bi-layer imaging layer | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2004-05-18 |
| 6689541 | Process for forming a photoresist mask | Todd P. Lukanc, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2004-02-10 |
| 6664154 | Method of using amorphous carbon film as a sacrificial layer in replacement gate integration processes | Srikanteswara Dakshina-Murthy, Philip A. Fisher, Cyrus E. Tabery | 2003-12-16 |