Issued Patents All Time
Showing 76–100 of 105 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6323093 | Process for fabricating a semiconductor device component by oxidizing a silicon hard mask | Qi Xiang, Chih-Yuh Yang | 2001-11-27 |
| 6309926 | Thin resist with nitride hard mask for gate etch application | Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2001-10-30 |
| 6306560 | Ultra-thin resist and SiON/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2001-10-23 |
| 6306710 | Fabrication of a gate structures having a longer length toward the top for formation of a rectangular shaped spacer | Wei Long, Olov Karlsson, Bill Liu | 2001-10-23 |
| 6287918 | Process for fabricating a metal semiconductor device component by lateral oxidization | Qi Xiang, Chih-Yuh Yang | 2001-09-11 |
| 6262435 | Etch bias distribution across semiconductor wafer | Marina V. Plat, Luigi Capodieci, Todd P. Lukanc | 2001-07-17 |
| 6214683 | Process for fabricating a semiconductor device component using lateral metal oxidation | Qi Xiang, Chih-Yuh Yang | 2001-04-10 |
| 6211044 | Process for fabricating a semiconductor device component using a selective silicidation reaction | Qi Xiang, Chih-Yuh Yang | 2001-04-03 |
| 6200907 | Ultra-thin resist and barrier metal/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2001-03-13 |
| 6184128 | Method using a thin resist mask for dual damascene stop layer etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2001-02-06 |
| 6171763 | Ultra-thin resist and oxide/nitride hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2001-01-09 |
| 6165695 | Thin resist with amorphous silicon hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang | 2000-12-26 |
| 6162587 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang | 2000-12-19 |
| 6156658 | Ultra-thin resist and silicon/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2000-12-05 |
| 6140023 | Method for transferring patterns created by lithography | Harry J. Levinson, Christopher F. Lyons, Khanh B. Nguyen, Fei Wang, Chih-Yuh Yang | 2000-10-31 |
| 6133129 | Method for fabricating a metal structure with reduced length that is beyond photolithography limitations | Qi Xiang, Chih-Yuh Yang | 2000-10-17 |
| 6127070 | Thin resist with nitride hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang | 2000-10-03 |
| 6121155 | Integrated circuit fabrication critical dimension control using self-limiting resist etch | Chih-Yuh Yang, Qi Xiang | 2000-09-19 |
| 6121123 | Gate pattern formation using a BARC as a hardmask | Christopher F. Lyons, Olov Karlsson | 2000-09-19 |
| 6107172 | Controlled linewidth reduction during gate pattern formation using an SiON BARC | Chih-Yuh Yang, Daniel A. Steckert | 2000-08-22 |
| 6103611 | Methods and arrangements for improved spacer formation within a semiconductor device | William G. En, Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Olov Karlsson +1 more | 2000-08-15 |
| 6060377 | Method for fabricating a polysilicon structure with reduced length that is beyond photolithography limitations | Qi Xiang, Chih-Yuh Yang | 2000-05-09 |
| 6020269 | Ultra-thin resist and nitride/oxide hard mask for metal etch | Fei Wang, Christopher F. Lyons, Khanh B. Nguyen, Harry J. Levinson, Chih-Yuh Yang | 2000-02-01 |
| 5990524 | Silicon oxime spacer for preventing over-etching during local interconnect formation | William G. En, Minh Van Ngo, Chih-Yuh Yang, David K. Foote, Olov Karlsson +1 more | 1999-11-23 |
| 5965461 | Controlled linewidth reduction during gate pattern formation using a spin-on barc | Chih-Yuh Yang, Daniel A. Steckert | 1999-10-12 |