Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Two mask photoresist exposure pattern for dense and isolated regions

Two mask photoresist exposure pattern for dense and isolated regions

US Patent 7368225 · Granted May 6, 2008

Estimated economic value: $14,545,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Real time drip chamber monitor2025
Locking cap assembly2025
System recovery during CGI-WL defect2025
Modular witnessing device2025
Method of spacer formation with straight sidewall of memory cells2025
Secure smart container assembly, systems, and methods2025
Wasting station for medications2024
Secure smart container assembly, systems, and methods2024
Interactive inventory storage device, system, and method2024
Secure inventory access and control mechanism2024
Integrated liquid flow closed loop sensing and control2024
UECC failure handling method2023