Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7838201 | Method for manufacturing a semiconductor device | Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim | 2010-11-23 |
| 7615338 | Photoresist coating composition and method for forming fine pattern using the same | Geun Su Lee, Seung Hun Lee | 2009-11-10 |
| 7534548 | Polymer for immersion lithography and photoresist composition | Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim | 2009-05-19 |
| 7494599 | Method for fabricating fine pattern in semiconductor device | Sung-Kwon Lee, Won-Kyu Kim | 2009-02-24 |
| 7494935 | Method for forming fine pattern of semiconductor device | Jae Chang Jung, Cheol Kyu Bok, Myoung Ja Min, Keun Do Ban, Hee Youl Lim | 2009-02-24 |
| 7462439 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim | 2008-12-09 |
| 7442648 | Method for fabricating semiconductor device using tungsten as sacrificial hard mask | Kwang-Ok Kim, Yun-Seok Cho, Jin-Ki Jung, Sung-Kwon Lee, Jun Sun +3 more | 2008-10-28 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern | Jae Chang Jung, Cheol Kyu Bok, Sam Young Kim, Chang Moon Lim | 2008-09-02 |
| 7381519 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim | 2008-06-03 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device | Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim | 2007-12-04 |
| 7288364 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | Jae Chang Jung, Cheol Kyu Bok, Sam Young Kim, Chang Moon Lim | 2007-10-30 |
| 7238653 | Cleaning solution for photoresist and method for forming pattern using the same | Geun Su Lee, Cheol Kyu Bok, Young Sun Hwang, Sung Koo Lee, Ki Soo Shin | 2007-07-03 |
| 7205089 | Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same | Jae Chang Jung, Cheol Kyu Bok, Ki Soo Shin | 2007-04-17 |
| 7198887 | Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same | Geun-soo Lee, Cheol Kyu Bok, Ki Soo Shin, Won-Wook Lee | 2007-04-03 |
| 7022458 | Photoresist polymer and photoresist composition containing the same | Geun Su Lee, Cheol Kyu Bok, Ki Soo Shin, Jae-Hyun Kim, Jung Woo Kim +2 more | 2006-04-04 |
| 6916594 | Overcoating composition for photoresist and method for forming photoresist pattern using the same | Cheol Kyu Bok, Jae Chang Jung, Ki Soo Shin | 2005-07-12 |
| 5741625 | Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material | Sang Man Bae | 1998-04-21 |
| 5716758 | Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks | Sang Man Bae | 1998-02-10 |
| 5705319 | Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers | Sang Man Bae | 1998-01-06 |
| 5650250 | Light exposure mask for semiconductor devices | — | 1997-07-22 |
| 5635335 | Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask | Sang Man Bae | 1997-06-03 |
| 5583069 | Method for making a fine annular charge storage electrode in a semiconductor device using a phase-shift mask | Chang Nam Ahn, Ik Boum Hur, Hung-Eil Kim, Il Ho Lee | 1996-12-10 |
| 5157002 | Method for forming a mask pattern for contact hole | — | 1992-10-20 |