Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9612524 | Reflective mask and method of fabricating the same | In Hwan Lee, Sun Young Koo, Seo Min Kim, Yong Dae Kim, Jin-Soo Kim +4 more | 2017-04-04 |
| 9105655 | Semiconductor device and method for manufacturing the same | Byoung Hoon Lee | 2015-08-11 |
| 8906584 | Photomask and method for forming pattern of semiconductor device using the same | Byoung Hoon Lee, Myoung Soo Kim, Jeong Su PARK, Jun Taek Park, In Hwan Lee | 2014-12-09 |
| 8841219 | Lithography processes utilizing extreme ultraviolet rays and methods of manufacturing semiconductor devices using the same | Jun Taek Park, Seok Kyun Kim | 2014-09-23 |
| 7915113 | Semiconductor device and method for manufacturing the same | Jin-Soo Kim | 2011-03-29 |
| 7838201 | Method for manufacturing a semiconductor device | Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon | 2010-11-23 |
| 7629595 | Method for fabricating semiconductor device | Jae Chang Jung | 2009-12-08 |
| 7571424 | Diffused aerial image model semiconductor device fabrication | Jun Taek Park | 2009-08-04 |
| 7553771 | Method of forming pattern of semiconductor device | Seo Min Kim | 2009-06-30 |
| 7534548 | Polymer for immersion lithography and photoresist composition | Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon | 2009-05-19 |
| 7462439 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon | 2008-12-09 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern | Jae Chang Jung, Cheol Kyu Bok, Sam Young Kim, Seung Chan Moon | 2008-09-02 |
| 7381519 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon | 2008-06-03 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device | Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon | 2007-12-04 |
| 7288364 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | Jae Chang Jung, Cheol Kyu Bok, Sam Young Kim, Seung Chan Moon | 2007-10-30 |
| 7008734 | Phase shift mask | Seo Min Kim | 2006-03-07 |
| 5770338 | Phase shifting overlay mark that measures exposure energy and focus | Chang Nam Ahn | 1998-06-23 |