Issued Patents All Time
Showing 1–25 of 95 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12247289 | Method for forming thin film using surface protection material | Jae Min Kim, Ha Na Kim, Woong Jin CHOI | 2025-03-11 |
| 11591691 | Method of forming a thin film using a surface protection material | Jae Min Kim, Ha Na Kim, Woong Jin CHOI, Eun Ae Jung, Dong Hyun Lee +4 more | 2023-02-28 |
| 10597777 | Precursor composition containing group IV organic compound and method for forming thin film using same | Yeong Min Lee | 2020-03-24 |
| 9892964 | Gap-fill polymer for filling fine pattern gaps and method for fabricating semiconductor device using the same | Ji-Won Moon, Jin-Wook Jang, Sang Youl Yi, Sung Jae Lee, Young-sun Lee +1 more | 2018-02-13 |
| 9029273 | Method for forming silicon oxide film of semiconductor device | Hyung-Soon Park, Kwon Hong, Jong Min Lee, Hyung Hwan Kim, Ji Hye HAN | 2015-05-12 |
| 8202443 | Method of manufacturing a capacitor | — | 2012-06-19 |
| 7781145 | Method for forming a photoresist pattern | Sam Young Kim, Keun Do Ban | 2010-08-24 |
| 7615338 | Photoresist coating composition and method for forming fine pattern using the same | Seung Chan Moon, Seung Hun Lee | 2009-11-10 |
| 7563753 | Cleaning solution for removing photoresist | Jae Chang Jung, Ki Soo Shin, Keun Kyu Kong, Sung Koo Lee, Young Sun Hwang | 2009-07-21 |
| 7467632 | Method for forming a photoresist pattern | Cheol Kyu Bok | 2008-12-23 |
| 7449538 | Hard mask composition and method for manufacturing semiconductor device | — | 2008-11-11 |
| 7399570 | Water-soluble negative photoresist polymer and composition containing the same | — | 2008-07-15 |
| 7390611 | Photoresist coating composition and method for forming fine pattern using the same | — | 2008-06-24 |
| 7364837 | Method for pattern formation using photoresist cleaning solution | Won-Wook Lee, Sam Young Kim | 2008-04-29 |
| 7338742 | Photoresist polymer and photoresist composition containing the same | — | 2008-03-04 |
| 7329477 | Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same | Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh +3 more | 2008-02-12 |
| 7314853 | Cleaning solution for photoresist and method for forming pattern using the same | Sam Young Kim, Keun Do Ban | 2008-01-01 |
| 7270934 | Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern | — | 2007-09-18 |
| 7238653 | Cleaning solution for photoresist and method for forming pattern using the same | Cheol Kyu Bok, Young Sun Hwang, Sung Koo Lee, Seung Chan Moon, Ki Soo Shin | 2007-07-03 |
| 7235349 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | Sung Koo Lee, Jae Chang Jung, Ki Soo Shin | 2007-06-26 |
| 7208260 | Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same | Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Ki Ho Balk | 2007-04-24 |
| 7150961 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Ki Ho Baik | 2006-12-19 |
| 7138218 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | Sung Koo Lee, Jae Chang Jung, Ki Soo Shin | 2006-11-21 |
| 7132217 | Organic anti-reflective coating composition and pattern forming method using the same | Sam Young Kim | 2006-11-07 |
| 7083893 | Photoresist polymer and photoresist composition containing the same | — | 2006-08-01 |