Issued Patents All Time
Showing 1–25 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7329477 | Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same | Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh +3 more | 2008-02-12 |
| 7150961 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Geun Su Lee | 2006-12-19 |
| 6984482 | Top-coating composition for photoresist and process for forming fine pattern using the same | Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh +3 more | 2006-01-10 |
| 6956091 | Organic anti-reflective polymer and preparation thereof | Sung-Eun Hong, Min Ho Jung | 2005-10-18 |
| 6866984 | ArF photoresist copolymers | Jae Chang Jung, Cheol Kyu Bok | 2005-03-15 |
| 6824951 | Photoresist composition for resist flow process | Geun Su Lee, Jin-Soo Kim, Jae Chang Jung, Min Ho Jung | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Jae Chang Jung | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2004-11-02 |
| 6808859 | ArF photoresist copolymers | Jae Chang Jung, Cheol Kyu Bok | 2004-10-26 |
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Sung-Eun Hong, Min Ho Jung, Hyeong Soo Kim, Jae Chang Jung | 2004-09-28 |
| 6780953 | Organic polymer for anti-reflective coating layer and preparation thereof | Min Ho Jung, Sung-Eun Hong | 2004-08-24 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Geun Su Lee | 2004-08-03 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2004-08-03 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong | 2004-08-03 |
| 6764806 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | Jae Chang Jung, Keun Kyu Kong, Cha-Won Koh, Jin-Soo Kim | 2004-07-20 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Jae Chang Jung | 2004-06-22 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Jae Chang Jung, Geun Su Lee, Min Ho Jung | 2004-02-17 |
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Jae Chang Jung, Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong | 2003-12-16 |
| 6632903 | Polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2003-10-14 |
| 6630281 | Photoresist composition for top-surface imaging processes by silylation | Cha-Won Koh, Geun Su Lee | 2003-10-07 |
| 6627379 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Jin-Soo Kim, Jae Chang Jung, Geun Su Lee | 2003-09-30 |
| 6627383 | Photoresist monomer comprising bisphenol derivatives and polymers thereof | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2003-09-30 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok | 2003-08-19 |
| 6602650 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Geun Su Lee | 2003-08-05 |