Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9947546 | Semiconductor integrated circuit device with a surface and method of manufacturing the same | Jae Hee SIM, Min Seok Son, Jeong Hoon An | 2018-04-17 |
| 7749895 | Capacitor of semiconductor device and method for fabricating the same | — | 2010-07-06 |
| 7674708 | Method for forming fine patterns of a semiconductor device | — | 2010-03-09 |
| 7582525 | Method for fabricating capacitor of semiconductor memory device using amorphous carbon | Jae Chang Jung | 2009-09-01 |
| 7563753 | Cleaning solution for removing photoresist | Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Sung Koo Lee, Young Sun Hwang | 2009-07-21 |
| 7510979 | Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same | Jae Chang Jung, Jin-Soo Kim | 2009-03-31 |
| 7510973 | Method for forming fine pattern in semiconductor device | — | 2009-03-31 |
| 7329477 | Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same | Jae Chang Jung, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2008-02-12 |
| 7285370 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Jae Chang Jung, Jin-Soo Kim | 2007-10-23 |
| 7208260 | Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same | Jae Chang Jung, Min Ho Jung, Geun Su Lee, Ki Ho Balk | 2007-04-24 |
| 7186496 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Jae Chang Jung, Young Sik Kim | 2007-03-06 |
| 7160668 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Jae Chang Jung, Young Sik Kim | 2007-01-09 |
| 7033729 | Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same | Jae Chang Jung, Seok Kyun Kim | 2006-04-25 |
| 6984482 | Top-coating composition for photoresist and process for forming fine pattern using the same | Jae Chang Jung, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2006-01-10 |
| 6787285 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | Gyu-Dong Park, Jae Chang Jung, Ki Soo Shin | 2004-09-07 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Min Ho Jung, Sung-Eun Hong, Ki Ho Baik | 2004-08-03 |
| 6764806 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | Jae Chang Jung, Cha-Won Koh, Jin-Soo Kim, Ki Ho Baik | 2004-07-20 |
| 6703323 | Method of inhibiting pattern collapse using a relacs material | Sung Koo Lee | 2004-03-09 |
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Jae Chang Jung, Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Ki Ho Baik | 2003-12-16 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-07-15 |
| 6514665 | Additives for improving post exposure delay stability of photoresist | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2003-02-04 |
| 6482565 | Photoresist cross-linker and photoresist composition comprising the same | Jae Chang Jung, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-11-19 |
| 6455225 | Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same | Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2002-09-24 |
| 6399792 | Photoresist cross-linker and photoresist composition comprising the same | Jae Chang Jung, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-06-04 |
| 6395451 | Photoresist composition containing photo base generator with photo acid generator | Jae Chang Jung, Jin-Soo Kim, Ki Ho Baik | 2002-05-28 |