SL

Sung Koo Lee

SH Sk Hynix: 16 patents #452 of 4,849Top 10%
KT Korea Institute Of Industrial Technology: 2 patents #141 of 668Top 25%
KAIST: 1 patents #5,996 of 11,619Top 55%
LG: 1 patents #17,402 of 26,165Top 70%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Seoul, KR: #2,421 of 39,741 inventorsTop 7%
Overall (All Time): #179,137 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Showing 1–23 of 23 patents

Patent #TitleCo-InventorsDate
12350401 Mesenchymal stem cells-hydrogel-biodegradable or mesenchymal stem cells-hydrogel-nondegradable support composition for alleviating or improving epidermolysis bullosa Mihyung KIM 2025-07-08
11692055 Composition for forming polyurethane film and article comprising coating layer derived from the same Sung Woo Hong, Pyong Hwa Hong, Gyeong Min MOON, Jin Sil Kim 2023-07-04
11651968 Method for forming planarization layer and pattern forming method using the same Ji Sok Lee, Jae Hee SIM 2023-05-16
11535693 Composition for forming polyurethane film, polyurethane-film derived therefrom and article comprising the same Sung Woo Hong, Pyong Hwa Hong, Jin Sil Kim, Gyeong Min MOON, Kiseung Kim 2022-12-27
11520875 Electronic device for processing video signal and computer readable recording medium Hye-Kyoung Jeon, Ho-Seok Kang, Jun Hyun Park, Woong-Ho Hong, Moo Young Kim 2022-12-06
10315577 Side mirror for vehicle Jin Gu Kim, Jin Wook Baek, Gang Woong Lee, Ho-Cheol Lee 2019-06-11
9570680 Method for fabricating electronic devices having semiconductor memory unit Jae-Heon Kim 2017-02-14
8609544 Method for fabricating semiconductor device 2013-12-17
8158528 Method for forming pattern of semiconductor device 2012-04-17
7807336 Method for manufacturing semiconductor device Jae Chang Jung 2010-10-05
7759052 Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same Jae Chang Jung 2010-07-20
7749680 Photoresist composition and method for forming pattern of a semiconductor device Jae Chang Jung 2010-07-06
7655568 Method for manufacturing underlying pattern of semiconductor device Jae Chang Jung 2010-02-02
7563753 Cleaning solution for removing photoresist Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Keun Kyu Kong, Young Sun Hwang 2009-07-21
7507485 Organic electroluminescent device Hyoung Yun Oh, Chun Gun Park, Jeong-Dae Seo, Myung Seop Kim 2009-03-24
7238653 Cleaning solution for photoresist and method for forming pattern using the same Geun Su Lee, Cheol Kyu Bok, Young Sun Hwang, Seung Chan Moon, Ki Soo Shin 2007-07-03
7235349 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator Jae Chang Jung, Geun Su Lee, Ki Soo Shin 2007-06-26
7220679 Method for forming patterns in a semiconductor device Jae Chang Jung, Young Sun Hwang, Cheol Kyu Bok, Ki Soo Shin 2007-05-22
7138218 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator Jae Chang Jung, Geun Su Lee, Ki Soo Shin 2006-11-21
7081325 Photoresist polymer and photoresist composition including the same Jae Chang Jung 2006-07-25
6764964 Method for forming patterns of a semiconductor device Young Sun Hwang, Jae Chang Jung, Chcol-kyu Bok, Ki Soo Shin 2004-07-20
6703323 Method of inhibiting pattern collapse using a relacs material Keun Kyu Kong 2004-03-09
6682782 Organic compound having an acetylene group, vacuum deposition polymerization thereof, deposited polymerized thin film, and electroluminescence device containing same Sang Hyun Jung, Chang Jin Lee, Yong K. Kang, Hee Jung Kim 2004-01-27