Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12386554 | Memory system and method of operating the same | Soo Hong Ahn, Joon Seop SIM | 2025-08-12 |
| 11776614 | Memory system, data processing system and method of operating the same | Soo Hong Ahn | 2023-10-03 |
| 11514972 | Memory system, data processing system and method of operating the same | Soo Hong Ahn | 2022-11-29 |
| 8057965 | Mask and method of fabricating the same | — | 2011-11-15 |
| 7339211 | Semiconductor device and method for fabricating the same | Dong-Sauk Kim, Ho Seok Lee, Byung-Jun Park, Il Young Kwon, Jong Min Lee +3 more | 2008-03-04 |
| 7329477 | Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same | Jae Chang Jung, Keun Kyu Kong, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2008-02-12 |
| 6984482 | Top-coating composition for photoresist and process for forming fine pattern using the same | Jae Chang Jung, Keun Kyu Kong, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2006-01-10 |
| 6864590 | Alignment mark for aligning wafer of semiconductor device | Sang Man Bae | 2005-03-08 |
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik | 2004-09-28 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong, Jae Chang Jung +2 more | 2004-03-02 |
| 6627384 | Photoresist composition for resist flow process and process for forming a contact hole using the same | Jae Chang Jung | 2003-09-30 |
| 6537724 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Geun Su Lee, Jin-Soo Kim, Ki Ho Baik | 2003-03-25 |
| 6492441 | Anti reflective coating polymers and the preparation method thereof | Sung-Eun Hong, Min Ho Jung, Ki Ho Baik | 2002-12-10 |
| 6482565 | Photoresist cross-linker and photoresist composition comprising the same | Jae Chang Jung, Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Ki Ho Baik | 2002-11-19 |
| 6455226 | Photoresist polymers and photoresist composition containing the same | Geun Su Lee, Jae Chang Jung, Ki Ho Baik | 2002-09-24 |
| 6399792 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Jae Chang Jung, Myoung Soo Kim, Hyoung Gi Kim, Ki Ho Baik | 2002-06-04 |
| 6368773 | Photoresist cross-linker and photoresist composition comprising the same | Jae Chang Jung, Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Ki Ho Baik +1 more | 2002-04-09 |
| 6359153 | Photoresist monomers and preparation thereof | Geun Su Lee, Chang-Il Choi, Jin-Soo Kim, Jae Chang Jung, Min Ho Jung +1 more | 2002-03-19 |
| 6350818 | Anti reflective coating polymers and the preparation method thereof | Sung-Eun Hong, Min Ho Jung, Ki Ho Baik | 2002-02-26 |
| 6312868 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Jae Chang Jung, Myoung Soo Kim, Hyoung Gi Kim, Ki Ho Baik | 2001-11-06 |
| 5922495 | Mask for use in stitching exposure process | — | 1999-07-13 |
| 5821034 | Method for forming micro patterns of semiconductor devices | Chang Mun Lim, Ki Ho Baik | 1998-10-13 |
| 5593813 | Method for forming submicroscopic patterns | — | 1997-01-14 |
| 5491047 | Method of removing a silylated or germanium implanted photoresist | Tai Kiyung Won | 1996-02-13 |