GL

Geun Su Lee

SH Sk Hynix: 58 patents #47 of 4,849Top 1%
HE Hynix (Hyundai Electronics): 34 patents #6 of 1,604Top 1%
DC Dongjin Semichem Co.: 2 patents #38 of 252Top 20%
EC Egtm Co.: 2 patents #7 of 25Top 30%
HC Hyundai Electronics Co.: 1 patents #4 of 43Top 10%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
YC Young Chang Chemical Co.: 1 patents #10 of 11Top 95%
Overall (All Time): #16,006 of 4,157,543Top 1%
95
Patents All Time

Issued Patents All Time

Showing 51–75 of 95 patents

Patent #TitleCo-InventorsDate
6686123 Photoresist monomer, polymer thereof and photoresist composition containing the same Jae Chang Jung, Min Ho Jung 2004-02-03
6653047 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same Jae Chang Jung, Ki Soo Shin 2003-11-25
6630281 Photoresist composition for top-surface imaging processes by silylation Cha-Won Koh, Ki Ho Baik 2003-10-07
6627383 Photoresist monomer comprising bisphenol derivatives and polymers thereof Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2003-09-30
6627379 Photoresist composition for resist flow process, and process for forming contact hole using the same Jin-Soo Kim, Jae Chang Jung, Ki Ho Baik 2003-09-30
6613493 Photoresist polymer and composition having nitro groups Jae Chang Jung, Ki Soo Shin 2003-09-02
6610616 Method for forming micro-pattern of semiconductor device Cha-Won Koh, Sung-Eun Hong, Min Ho Jung, Jin-Soo Kim, Jae Chang Jung 2003-08-26
6602650 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2003-08-05
6599678 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2003-07-29
6593446 Organic polymer for organic anti-reflective coating layer and preparation thereof Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Ki Ho Baik 2003-07-15
6589707 Partially crosslinked polymer for bilayer photoresist Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2003-07-08
6586619 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2003-07-01
6582883 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2003-06-24
6573012 Photoresist monomers, polymers thereof and photoresist compositions using the same Jae Chang Jung, Ki Ho Baik 2003-06-03
6569599 Partially crosslinked polymer for bilayer photoresist Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2003-05-27
6562925 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2003-05-13
6548613 Organic anti-reflective coating polymer and preparation thereof Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Ki Ho Baik 2003-04-15
6537724 Photoresist composition for resist flow process, and process for forming contact hole using the same Jin-Soo Kim, Hyeong Soo Kim, Ki Ho Baik 2003-03-25
6531562 Photoresist monomer, polymer thereof and photoresist composition containing it Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2003-03-11
6514665 Additives for improving post exposure delay stability of photoresist Jae Chang Jung, Keun Kyu Kong, Ki Ho Baik 2003-02-04
6489432 Organic anti-reflective coating polymer and preparation thereof Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Ki Ho Baik 2002-12-03
6486283 Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof Sung-Eun Hong, Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2002-11-26
6465147 Cross-linker for photoresist, and process for forming a photoresist pattern using the same Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2002-10-15
6455226 Photoresist polymers and photoresist composition containing the same Jae Chang Jung, Hyeong Soo Kim, Ki Ho Baik 2002-09-24
6455225 Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same Keun Kyu Kong, Jae Chang Jung, Ki Ho Baik 2002-09-24