GL

Geun Su Lee

SH Sk Hynix: 58 patents #47 of 4,849Top 1%
HE Hynix (Hyundai Electronics): 34 patents #6 of 1,604Top 1%
DC Dongjin Semichem Co.: 2 patents #38 of 252Top 20%
EC Egtm Co.: 2 patents #7 of 25Top 30%
HC Hyundai Electronics Co.: 1 patents #4 of 43Top 10%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
YC Young Chang Chemical Co.: 1 patents #10 of 11Top 95%
Overall (All Time): #16,006 of 4,157,543Top 1%
95
Patents All Time

Issued Patents All Time

Showing 76–95 of 95 patents

Patent #TitleCo-InventorsDate
6448352 Photoresist monomer, polymer thereof and photoresist composition containing it Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2002-09-10
6426171 Photoresist monomer, polymer thereof and photoresist composition containing it Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2002-07-30
6416926 Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same Jae Chang Jung, Chi Hyeong Roh, Min Ho Jung, Ki Ho Baik 2002-07-09
6410670 Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2002-06-25
6403281 Cross-linker monomer comprising double bond and photoresist copolymer containing the same Jae Chang Jung, Ki Ho Baik 2002-06-11
6399272 Phenylenediamine derivative-type additive useful for a chemically amplified photoresist Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2002-06-04
6391518 Polymers and photoresist compositions using the same Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2002-05-21
6387589 Photoresist polymers and photoresist compositions containing the same Cha-Won Koh, Ki Ho Baik 2002-05-14
6376632 Photoresist polymers of carboxyl-containing alicyclic compounds Jae Chang Jung, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik 2002-04-23
6368771 Photoresist polymers and photoresist compositions containing the same Cha-Won Koh, Jae Chang Jung, Myoung Soo Kim 2002-04-09
6368770 Photoresist monomers, polymers thereof, and photoresist compositions containing the same Min Ho Jung, Jae Chang Jung, Ki Ho Baik 2002-04-09
6359153 Photoresist monomers and preparation thereof Chang-Il Choi, Hyeong Soo Kim, Jin-Soo Kim, Jae Chang Jung, Min Ho Jung +1 more 2002-03-19
6316162 Polymer and a forming method of a micro pattern using the same Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Min Ho Jung +2 more 2001-11-13
6291131 Monomers for photoresist, polymers thereof, and photoresist compositions using the same Jae Chang Jung, Chi Hyeong Roh, Min Ho Jung, Keun Kyu Kong, Ki Ho Baik 2001-09-18
6265130 Photoresist polymers of carboxyl-containing alicyclic compounds Jae Chang Jung, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik 2001-07-24
6235448 Photoresist monomers, polymers thereof, and photoresist compositions containing the same Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik 2001-05-22
6235447 Photoresist monomers, polymers thereof, and photoresist compositions containing the same Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2001-05-22
6225020 Polymer and a forming method of a micro pattern using the same Jae Chang Jung, Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Min Ho Jung +2 more 2001-05-01
6200731 Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik 2001-03-13
6150069 Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same Jae Chang Jung, Chi Hyeong Roh, Min Ho Jung, Ki Ho Baik 2000-11-21