Issued Patents All Time
Showing 26–50 of 95 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7056872 | Solution composition for removing a remaining photoresist resin | Jae Chang Chung, Ki Soo Shin, Kee-Joon Oh | 2006-06-06 |
| 7033732 | Method of preparing anti-reflective coating polymer and anti-reflecting coating composition comprising an anti-reflecting coating polymer | — | 2006-04-25 |
| 7022458 | Photoresist polymer and photoresist composition containing the same | Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin, Jae-Hyun Kim, Jung Woo Kim +2 more | 2006-04-04 |
| 7011924 | Photoresist polymers and photoresist compositions comprising the same | — | 2006-03-14 |
| 6998442 | Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof | Min Ho Jung, Jae Chang Jung, Ki Soo Shin | 2006-02-14 |
| 6984482 | Top-coating composition for photoresist and process for forming fine pattern using the same | Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh +3 more | 2006-01-10 |
| 6924078 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Deog-Bae Kim, Jae-Hyun Kim | 2005-08-02 |
| 6921622 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | Jae Chang Jung, Ki Soo Shin | 2005-07-26 |
| 6861199 | Photoresist composition | — | 2005-03-01 |
| 6858371 | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same | Jae Chang Jung, Min Ho Jung, Cha-Won Koh, Ki Soo Shin | 2005-02-22 |
| 6849375 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | Jae Chang Jung, Ki Soo Shin | 2005-02-01 |
| 6841526 | Cleaning solution for removing photoresist | Jae Chang Jung, Ki Soo Shin | 2005-01-11 |
| 6824951 | Photoresist composition for resist flow process | Jin-Soo Kim, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Jae Chang Jung, Ki Ho Baik | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-11-02 |
| 6806025 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | Jae Chang Jung, Ki Soo Shin | 2004-10-19 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Ki Ho Baik | 2004-08-03 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-08-03 |
| 6753128 | Photoresist additive for preventing acid migration and photoresist composition comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-06-22 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Jae Chang Jung, Ki Ho Baik | 2004-06-22 |
| 6749990 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | Jae Chang Jung, Ki Soo Shin | 2004-06-15 |
| 6737217 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-05-18 |
| 6720129 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-04-13 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong, Jae Chang Jung +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-02-17 |