Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9063424 | Isocyanurate compound for forming organic anti-reflective layer and composition including same | Hyo-Jung Roh, Dong-Kyu Ju, Hyun Jin Kim | 2015-06-23 |
| 8551684 | Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition | Jong Kyoung Park, Man Ho Han, Hyun Jin Kim | 2013-10-08 |
| 8293458 | Method for forming fine pattern in semiconductor device | Jun-Gyeong Lee, Jung-Youl Lee, Jeong Sik Kim, Eu-Jean Jang, Jae Woo Lee +1 more | 2012-10-23 |
| 7745099 | Photosensitive compound and photoresist composition including the same | Jung Woo Kim, Jae-Hyun Kim | 2010-06-29 |
| 7604919 | Monomer, polymer and composition for photoresist | Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae Woo Lee, Jae-Hyun Kim | 2009-10-20 |
| 7569325 | Monomer having sulfonyl group, polymer thereof and photoresist composition including the same | Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae Woo Lee, Jae-Hyun Kim | 2009-08-04 |
| 7504195 | Photosensitive polymer and photoresist composition | Jae-Hyun Kim | 2009-03-17 |
| 7465531 | Polymer for forming anti-reflective coating layer | Sang-Jung Kim, Jae-Hyun Kim | 2008-12-16 |
| 7419761 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | Jae Woo Lee, Jung-Youl Lee, Jae-Hyun Kim, Eun-Kyung Son | 2008-09-02 |
| 7368219 | Polymer for forming anti-reflective coating layer | Sang-Jung Kim, Jong-Yong Kim, Jae-Hyun Kim | 2008-05-06 |
| 7344820 | Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same | Eun-Kyung Son, Jae-Hyun Kang, Jae-Hyun Kim | 2008-03-18 |
| 7309561 | Polymer for forming anti-reflective coating layer | Sang-Jung Kim, Jae-Hyun Kim | 2007-12-18 |
| 7297463 | Photosensitive polymer and chemically amplified photoresist composition including the same | Sang-Jeoung Kim, Hwa Young Kim, Jin Jegal, Jae-Hyun Kim | 2007-11-20 |
| 7282530 | Polymer for forming anti-reflective coating layer | Sang-Jung Kim, Jae-Hyun Kim | 2007-10-16 |
| 6924078 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | Geun Su Lee, Jae Chang Jung, Ki Soo Shin, Se Jin Choi, Jae-Hyun Kim | 2005-08-02 |
| 6767687 | Polymer for chemically amplified resist and a resist composition using the same | Hyun Jin Kim, Yong-Joon Choi, Yoon-Sik Chung | 2004-07-27 |
| 6743881 | Chemically amplified resist and a resist composition | Hyeon Jin Kim, Yong-Joon Choi, Yoon-Sik Chung | 2004-06-01 |