Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12046464 | Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the same | Ga Young Song, Mi Hyun Park, Jong Kyoung Park, Hyun Jin Kim, Hyo-San Lee +2 more | 2024-07-23 |
| 10712662 | Methods of forming patterns using compositions for an underlayer of photoresist | Jin-A Ryu, Kyung-Lyul Moon, Yool Kang, Hyun Jin Kim, Yu-Jin Jeoung +1 more | 2020-07-14 |
| 9651867 | Compound and composition for forming lower film of resist pattern, and method for forming lower film using same | Su Young Han, Jae Woo Lee, Jae-Hyun Kim | 2017-05-16 |
| 9416296 | Resist underlayer composition and method for forming pattern using same | Young-Bae Lim, Jong Won Kim, Jae Woo Lee, Jae-Hyun Kim | 2016-08-16 |
| 8293458 | Method for forming fine pattern in semiconductor device | Jun-Gyeong Lee, Jeong Sik Kim, Eu-Jean Jang, Jae Woo Lee, Deog-Bae Kim +1 more | 2012-10-23 |
| 8124311 | Photosensitive molecular compound and photoresist composition including the same | Jeong Sik Kim, Eu-Jean Jang, Jae Woo Lee, Jae-Hyun Kim | 2012-02-28 |
| 7935474 | Acid-amplifier having acetal group and photoresist composition including the same | Min-Ja Yoo, Jeong Sik Kim, Young-Bae Lim, Jae Woo Lee, Jae-Hyun Kim | 2011-05-03 |
| 7695893 | Photo-sensitive compound and photoresist composition including the same | Jae Woo Lee, Jeong Sik Kim, Eu-Jean Jang, Jae-Hyun Kim | 2010-04-13 |
| 7604919 | Monomer, polymer and composition for photoresist | Deog-Bae Kim, Geun-Jong Yu, Sang-Jung Kim, Jae Woo Lee, Jae-Hyun Kim | 2009-10-20 |
| 7569325 | Monomer having sulfonyl group, polymer thereof and photoresist composition including the same | Geun-Jong Yu, Sang-Jung Kim, Jae Woo Lee, Deog-Bae Kim, Jae-Hyun Kim | 2009-08-04 |
| 7501222 | Photoresist monomer polymer thereof and photoresist composition including the same | Jae Woo Lee, Jae-Hyun Kim | 2009-03-10 |
| 7419761 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | Jae Woo Lee, Deog-Bae Kim, Jae-Hyun Kim, Eun-Kyung Son | 2008-09-02 |