Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11189491 | Method of forming mask pattern and method of fabricating semiconductor device using the same | Chul-Ho Kim, Jaesung Kang, Jinphil Choi | 2021-11-30 |
| 10712662 | Methods of forming patterns using compositions for an underlayer of photoresist | Jin-A Ryu, Jung-Youl Lee, Kyung-Lyul Moon, Hyun Jin Kim, Yu-Jin Jeoung +1 more | 2020-07-14 |
| 10236185 | Method of forming patterns for semiconductor device | Kyoung-sil Park, Yun-Seok Choi, Boo-Deuk Kim, Ye Hwan Kim | 2019-03-19 |
| 9892915 | Hard mask composition, carbon nanotube layer structure, pattern forming method, and manufacturing method of semiconductor device | Seung Yun Yang, Seung Hyun Lee, Kyoung-sil Park, Yi Seul Kim, Yun-Seok Choi | 2018-02-13 |
| 9613821 | Method of forming patterns and method of manufacturing integrated circuit device | Dong Won Kim, Ju Young Kim, Tae Hoon Kim, Hye Ji KIM, Su-Min Park +1 more | 2017-04-04 |
| 9337032 | Method of forming pattern of semiconductor device | Hyung-Rae Lee, Seong-Ji Kwon | 2016-05-10 |
| 8987118 | Method of fabricating semiconductor device | Hyung-Rae Lee, Keita Kato, Atsushi Nakamura, Suk Koo HONG, Jae-Ho Kim +2 more | 2015-03-24 |
| 8778598 | Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion | Suk-Joo Lee, Jung-hyeon Lee, Shi-Yong Yi | 2014-07-15 |
| 8735053 | Methods of forming photoresist patterns | Subramanya Mayya, Takahiro Yasue, Seok-Hwan Oh | 2014-05-27 |
| 8623739 | Method of manufacturing semiconductor device using acid diffusion | Hyung-Rae Lee, Kyung-Hwan Yoon, Hyoung-hee Kim, So-Ra Han, Tae-Hoi Park | 2014-01-07 |
| 8536347 | Photoacid generator, chemically amplified resist composition including the same, and associated methods | Hak-won Kim, Weoun-ju Kim, Seong-woon Choi, Hyun-Woo Kim, Hai-sub Na +1 more | 2013-09-17 |
| 8431331 | Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion | Suk-Joo Lee, Jung-hyeon Lee, Shi-Yong Yi | 2013-04-30 |
| 8314036 | Methods of forming fine patterns of semiconductor device | Seongho Moon, Hyounghee Kim, Seokhwan Oh, So-Ra Han, Seongwoon Choi | 2012-11-20 |
| 8227349 | Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same | Hyoung-hee Kim, Seong Ho Moon, Seok-Hwan Oh, So-Ra Han, Seong-woon Choi | 2012-07-24 |
| 8173358 | Method of forming fine patterns of a semiconductor device | Hyoung-hee Kim, Seong-woon Choi, Jin Young Yoon | 2012-05-08 |
| 7862988 | Method for forming patterns of semiconductor device | Cha-Won Koh, Sang-Gyun Woo, Seok-Hwan Oh, Gi-Sung Yeo, Ji-Young Lee | 2011-01-04 |
| 7842450 | Method of forming a semiconductor device | Doo-Youl Lee, Suk-Joo Lee, Han-ku Cho, Chang-Jin Kang, Jae-ok Yoo +1 more | 2010-11-30 |
| 7678650 | Nonvolatile memory device and method of manufacturing the same | Cha-Won Koh, Byung-Hong Chung, Sang-Gyun Woo, Jeong-Lim Nam, Seok-Hwan Oh +2 more | 2010-03-16 |
| 7560768 | Nonvolatile memory device and method of manufacturing the same | Cha-Won Koh, Byung-Hong Chung, Sang-Gyun Woo, Jeong-Lim Nam, Seok-Hwan Oh +2 more | 2009-07-14 |
| 6803176 | Methods for forming line patterns in semiconductor substrates | Sang-jun Choi, Joo-tae Moon, Jeong-hee Chung, Sang-Gyun Woo | 2004-10-12 |
| 6787287 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | Hyun-Woo Kim, Sang-Gyun Woo | 2004-09-07 |
| 6753125 | Photosensitive polymer having fused aromatic ring and photoresist composition containing the same | Sang-jun Choi | 2004-06-22 |
| 6485895 | Methods for forming line patterns in semiconductor substrates | Sang-jun Choi, Joo-tae Moon, Jeong-hee Chung, Sang-Gyun Woo | 2002-11-26 |
| 6300036 | Photosensitive polymers and chemically amplified photoresist compositions using the same | Sang-jun Choi, Dong-won Jung, Chun-geun Park | 2001-10-09 |
| 6284438 | Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same | Sang-jun Choi, Si-hyeung Lee, Joo-tae Moon | 2001-09-04 |