Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6713229 | Terpolymer for amplified resist | Sang-jun Choi, Young-bum Koh | 2004-03-30 |
| 6416927 | Chemically amplified resist compositions | Sang-jun Choi, Young-bum Koh | 2002-07-09 |
| 6300036 | Photosensitive polymers and chemically amplified photoresist compositions using the same | Sang-jun Choi, Yool Kang, Dong-won Jung | 2001-10-09 |
| 6280903 | Chemically amplified resist composition | Yool Kang, Sang-jun Choi, Dong-won Jung, Young-bum Koh | 2001-08-28 |
| 6171754 | Chemically amplified resist compositions | Sang-jun Choi, Young-bum Koh | 2001-01-09 |
| 6114084 | Chemically amplified resist composition | Yool Kang, Sang-jun Choi, Dong-won Jung, Young-bum Koh | 2000-09-05 |
| 6103845 | Chemically amplified resist polymers | Sang-jun Choi, Young-bum Koh | 2000-08-15 |
| 5981141 | Chemically amplified resists | Sang-jun Choi, Hai Won Lee | 1999-11-09 |
| 5856411 | Resins for use in chemically amplified resists and manufacturing methods thereof | Sang-jun Choi | 1999-01-05 |
| 5851727 | Photosensitive polymers and photoresist compositions containing the same | Sang-jun Choi, Young-bum Koh | 1998-12-22 |
| 5847063 | Resins for use in chemically amplified resists and manufacturing methods thereof | Sang-jun Choi | 1998-12-08 |
| 5759755 | Semiconductor substrate containing anti-reflective layer | Gi-Sung Yeo, Jung Chul Park | 1998-06-02 |
| 5733704 | Resist compositions for chemically amplified resists comprising a di(t-butyl)malonyl methyl side group in the base polymer | Sang-jun Choi | 1998-03-31 |
| 5593725 | Anti-reflective layer and method for manufacturing semiconductor device using the same | Gi-Sung Yeo, Jung Chul Park | 1997-01-14 |
| 5496770 | Method for manufacturing a semiconductor chip bump having improved contact characteristics | — | 1996-03-05 |
| 5418186 | Method for manufacturing a bump on a semiconductor chip | Jong-Han Park, Seon-ho Ha | 1995-05-23 |